Patrick Laing: search on Z-Library

The world's largest scientific articles store. 70,000,000+ articles for free.

Don't use scam websites

51

Application of inverse source concepts to photoacoustic tomography

Anastasio, Mark A, Zhang, Jin, Modgil, Dimple, Rivière, Patrick J La

Journal:

Inverse Problems

Year:

2007

Language:

english

File:

PDF, 616 KB

english, 2007

52

A Heterogeneous 3D-IC Consisting of Two 28 nm FPGA Die and 32 Reconfigurable High-Performance Data Converters

Erdmann, Christophe, Lowney, Donnacha, Lynam, Adrian, Keady, Aidan, McGrath, John, Cullen, Edward, Breathnach, Daire, Keane, Denis, Lynch, Patrick, De La Torre, Marites, De La Torre, Ronnie, Lim, Peng

Journal:

IEEE Journal of Solid-State Circuits

Year:

2015

Language:

english

File:

PDF, 3.45 MB

english, 2015

53

Study of the Impact of Growth and Post-Growth Processes on the Surface Morphology of 4H Silicon Carbide Films

Camarda, Massimo, Canino, Andrea, Fiorenza, Patrick, Bongiorno, Corrado, Severino, Andrea, Raineri, Vito, La Magna, Antonino, La Via, Francesco, Mauceri, Marco, Abbondanza, Giuseppe, Pecora, Antonio,

Journal:

Materials Science Forum

Year:

2012

Language:

english

File:

PDF, 604 KB

english, 2012

54

Effects of the Growth Rate on the Quality of 4H Silicon Carbide Films for MOSFET Applications

Camarda, Massimo, Privitera, Stefania, Anzalone, Ruggero, Piluso, Nicolò, Fiorenza, Patrick, Alberti, Alessandra, Pellegrino, Giovanna, La Magna, Antonino, La Via, Francesco, Vecchio, Carmelo, Mauceri

Journal:

Materials Science Forum

Year:

2014

Language:

english

File:

PDF, 628 KB

english, 2014

55

Growth of 3C-SiC on Si: Influence of Process Pressure

Severino, Andrea, Frewin, Christopher L., Anzalone, Ruggero, Bongiorno, Corrado, Fiorenza, Patrick, D'Arrigo, Giuseppe, Giannazzo, Filippo, Foti, Gaetano, La Via, Francesco, Saddow, S.E.

Journal:

Materials Science Forum

Year:

2009

Language:

english

File:

PDF, 3.35 MB

english, 2009

56

Tracking natural and anthropogenic origins of dissolved arsenic during surface and groundwater interaction in a post-closure mining context: Isotopic constraints

Khaska, Mahmoud, Le Gal La Salle, Corinne, Verdoux, Patrick, Boutin, René

Journal:

Journal of Contaminant Hydrology

Year:

2015

Language:

english

File:

PDF, 1.88 MB

english, 2015

57

Interlaced interpolation weighting functions for multislice helical computed tomography

La Rivie`re, Patrick J.

Journal:

Optical Engineering

Year:

2003

Language:

english

File:

PDF, 233 KB

english, 2003

58

Penalized-likelihood image reconstruction for x-ray fluorescence computed tomography

La Rivière, Patrick J.

Journal:

Optical Engineering

Year:

2006

Language:

english

File:

PDF, 367 KB

english, 2006

59

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Resist pattern prediction at EUV

Biafore, John J., Smith, Mark D., van Setten, Eelco, Wallow, Tom, Naulleau, Patrick, Blankenship, David, Robertson, Stewart A., Deng, Yunfei, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 274 KB

english, 2010

60

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV brightness, spot size, and contamination measurements at the intermediate focus

Giovannini, Andrea Z., Morris, Oran, Henderson, Ian, Ellwi, Samir, Abhari, Reza S., La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 8.50 MB

english, 2011

61

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Optics contamination studies in support of high-throughput EUV lithography tools

Hill, S. B., Faradzhev, N. S., Richter, L. J., Grantham, S., Tarrio, C., Lucatorto, T. B., Yulin, S., Schürmann, M., Nesterenko, V., Feigl, T., La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 1.02 MB

english, 2011

62

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Characterization of line-edge roughness (LER) propagation from resists: underlayer interfaces in ultrathin resist films

George, Simi A., Naulleau, Patrick P., Krishnamoorthy, Ahila, Wu, Zeyu, Rutter, Jr., Edward W., Kennedy, Joseph T., Xie, Song Yuan, Flanigan, Kyle Y., Wallow, Thomas I., La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 8.06 MB

english, 2010

63

Self-determination theory as a fundamental theory of close relationships.

La Guardia, Jennifer G., Patrick, Heather

Journal:

Canadian Psychology

Year:

2008

Language:

english

File:

PDF, 101 KB

english, 2008

64

Application of acoustic feedback to target detection in a waveguide: Experimental demonstration at the ultrasonic scale

Roux, Philippe, Marandet, Christian, Rizza, Patrick La, Kuperman, W. A.

Journal:

The Journal of the Acoustical Society of America

Year:

2011

Language:

english

File:

PDF, 1.68 MB

english, 2011

65

[ACM Press the 12th ACM conference - Alexandria, VA, USA (2005.11.07-2005.11.11)] Proceedings of the 12th ACM conference on Computer and communications security - CCS '05 - Exploiting open functionality in SMS-capable cellular networks

Enck, William, Traynor, Patrick, McDaniel, Patrick, La Porta, Thomas

Year:

2005

Language:

english

File:

PDF, 597 KB

english, 2005

66

Correlation of the AOFAS Scores with a Generic Health Qualy Score in Foot and Ankle Surgery

Malviya, Ajay, Makwana, Nilesh, Laing, Patrick

Journal:

Foot & Ankle International

Year:

2007

Language:

english

File:

PDF, 75 KB

english, 2007

67

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Damage testing of EUV optics using focused radiation from a table-top LPP source

Mann, K., Barkusky, F., Bayer, A., Döring, S., La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 2.12 MB

english, 2011

68

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Efficient specification and characterization of surface roughness for extreme ultraviolet optics

Schröder, Sven, Trost, Marcus, Feigl, Torsten, Harvey, James E., Duparré, Angela, La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 2.75 MB

english, 2011

69

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness

George, Simi A., Naulleau, Patrick P., Gullikson, Eric M., Mochi, Iacopo, Salmassi, Farhad, Goldberg, Kenneth A., Anderson, Erik H., La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 376 KB

english, 2011

70

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch

Naulleau, Patrick, Anderson, Christopher N., Baclea-an, Lorie-Mae, Chan, David, Denham, Paul, George, Simi, Goldberg, Kenneth A., Hoef, Brian, Jones, Gideon, Koh, Chawon, La Fontaine, Bruno, McClinton

Year:

2010

Language:

english

File:

PDF, 3.47 MB

english, 2010

71

Community Law, International Law and the Italian Constitution

Antonio La Pergola and Patrick Del Duca

Journal:

The American Journal of International Law

Year:

1985

Language:

english

File:

PDF, 2.90 MB

english, 1985

72

Cafés et caféiers: Singularités et universalité d'une production mondialisée || Les fondements économiques de la guerre du café au Kenya

Bernard Charlery de la Masselière and Patrick Mbataru

Journal:

Études rurales

Year:

2007

File:

PDF, 1.81 MB

2007

73

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Interaction of benzene and toluene vapors with Ru(0001) surface: relevance to MLM contamination

Yakshinskiy, B. V., Shen, Q., Bartynski, R. A., La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 23.01 MB

english, 2011

74

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Light sources for EUV lithography at the 22-nm node and beyond

Fomenkov, Igor V., Böwering, Norbert R., Brandt, David C., Brown, Daniel J., Bykanov, Alexander N., Ershov, Alex I., La Fontaine, Bruno, Lercel, Michael J., Myers, David W., Naulleau, Patrick P., Wood

Year:

2012

Language:

english

File:

PDF, 5.11 MB

english, 2012

75

Do Changes in Lung Function Predict High-Altitude Pulmonary Edema at an Early Stage?

SENN, OLIVER, CLARENBACH, CHRISTIAN F., FISCHLER, MANUEL, THALMANN, RAHEL, BRUNNER-LA ROCCA, HANSPETER, EGGER, PATRICK, MAGGIORINI, MARCO, BLOCH, KONRAD E.

Journal:

Medicine & Science in Sports & Exercise

Year:

2006

Language:

english

File:

PDF, 120 KB

english, 2006

76

Guest Editorial: Special Section on the 2014 IEEE Custom Integrated Circuits Conference (CICC 2014)

de la Rosa, Jose M., Chiang, Patrick, Clark, Lawrence T.

Journal:

IEEE Transactions on Circuits and Systems I: Regular Papers

Year:

2015

Language:

english

File:

PDF, 602 KB

english, 2015

77

The continental Si cycle and its impact on the ocean Si isotope budget

Frings, Patrick J., Clymans, Wim, Fontorbe, Guillaume, De La Rocha, Christina L., Conley, Daniel J.

Journal:

Chemical Geology

Year:

2016

Language:

english

File:

PDF, 3.10 MB

english, 2016

78

Vital Statistics: Estimating Injury Mortality in Kigali, Rwanda

Kim, Woon Cho, Byiringiro, Jean Claude, Ntakiyiruta, Georges, Kyamanywa, Patrick, Irakiza, Jean Jacques, Mvukiyehe, Jean Paul, Mutabazi, Zeta, Vizir, Jean Paul, de la Croix Allen Ingabire, Jean, Nshut

Journal:

World Journal of Surgery

Year:

2016

Language:

english

File:

PDF, 622 KB

english, 2016

79

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Development of under layer material for EUV lithography

Sakamoto, Rikimaru, La Fontaine, Bruno M., Naulleau, Patrick P., Ho, Bang-Ching, Fujitani, Noriaki, Endo, Takafumi, Ohnishi, Ryuji

Year:

2011

Language:

english

File:

PDF, 2.35 MB

english, 2011

80

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time

La Fontaine, Bruno M., Anderson, Christopher N., Daggett, Joe, Naulleau, Patrick P.

Year:

2010

Language:

english

File:

PDF, 412 KB

english, 2010

81

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Development of an in-situ Sn cleaning method for extreme ultraviolet light lithography

Sporre, J., La Fontaine, Bruno M., Naulleau, Patrick P., Lofgren, R. E., Ruzic, D. N., Khodykin, O. V., Myers, D. W.

Year:

2011

Language:

english

File:

PDF, 1.55 MB

english, 2011

82

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV OPC for 56nm metal pitch

Burkhardt, Martin, La Fontaine, Bruno M., Naulleau, Patrick P., Colburn, Matt, Deng, Yunfei, Gallagher, Emily, Kato, Hirokazu, McIntyre, Greg, Petrillo, Karen, Raghunathan, Sudhar, Smith, Adam C., Wal

Year:

2011

Language:

english

File:

PDF, 2.58 MB

english, 2011

83

[IEEE 2016 3rd MEC International Conference on Big Data and Smart City (ICBDSC) - Muscat, Oman (2016.3.15-2016.3.16)] 2016 3rd MEC International Conference on Big Data and Smart City (ICBDSC) - Performance evaluation of G3 narrowband PLC standard for transmission through single and paired transformer

Dulay, Ann E., Astillero, Ralph Ian R., Rosa, Patrick Guillano P. La, Tan, Rex John Lewis L., Tapang, Andre D., Santos, Arnold

Year:

2016

Language:

english

File:

PDF, 337 KB

english, 2016

84

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Patterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithography

Vandeweyer, Tom, La Fontaine, Bruno M., Naulleau, Patrick P., De Backer, Johan, Versluijs, Janko, Truffert, Vincent, Verhaegen, Staf, Ercken, Monique, Dusa, Mircea

Year:

2011

Language:

english

File:

PDF, 10.50 MB

english, 2011

85

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Printability of buried mask defects in extreme UV lithography

Hsu, Pei-Cheng, La Fontaine, Bruno M., Naulleau, Patrick P., Yao, Ming-Jiun, Hsueh, Wen-Chang, Chen, Chia-Jen, Lee, Shin-Chang, Yu, Ching-Fang, Hsu, Luke, Chin, Sheng-Ji, Hu, Jimmy, Chang, Shu-Hao, Sh

Year:

2011

Language:

english

File:

PDF, 710 KB

english, 2011

86

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Plasma-assisted cleaning by metastable-atom neutralization (PACMAN): a plasma approach to cleanliness in lithography

Lytle, W. M., La Fontaine, Bruno M., Naulleau, Patrick P., Andruczyk, D., Jindal, V., Ruzic, D. N.

Year:

2011

Language:

english

File:

PDF, 2.22 MB

english, 2011

87

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - 100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Mizoguchi, Hakaru, La Fontaine, Bruno M., Naulleau, Patrick P., Abe, Tamotsu, Watanabe, Yukio, Ishihara, Takanobu, Ohta, Takeshi, Hori, Tsukasa, Yanagida, Tatsuya, Nagano, Hitoshi, Yabu, Takayuki, Nag

Year:

2011

Language:

english

File:

PDF, 924 KB

english, 2011

88

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Front Matter: Volume 7969

SPIE, Proceedings of, La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 304 KB

english, 2011

89

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Line width roughness control and pattern collapse solutions for EUV patterning

Petrillo, Karen, La Fontaine, Bruno M., Naulleau, Patrick P., Huang, George, Ashworth, Dominic, Georger, Jacque, Ren, Liping, Cho, K. Y., Montgomery, Warren, Wurm, Stefan, Kawakami, Shinichiro, Dunn,

Year:

2011

Language:

english

File:

PDF, 2.90 MB

english, 2011

90

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Shadowing effect modeling and compensation for EUV lithography

Song, Hua, La Fontaine, Bruno M., Naulleau, Patrick P., Zavyalova, Lena, Su, Irene, Shiely, James, Schmoeller, Thomas

Year:

2011

Language:

english

File:

PDF, 357 KB

english, 2011

91

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications

Horne, Stephen F., La Fontaine, Bruno M., Naulleau, Patrick P., Gustafson, Deborah, Partlow, Matthew J., Besen, Matthew M., Smith, Donald K., Blackborow, Paul A.

Year:

2011

Language:

english

File:

PDF, 2.20 MB

english, 2011

92

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV CAR extendibility study

La Fontaine, Bruno M., Koh, Chawon, Georger, Jacque, Ren, Liping, Huang, George, Goodwin, Frank, Wurm, Stefan, Ashworth, Dominic, Montgomery, Warren, Pierson, Bill, Park, Joo-on, Naulleau, Patrick

Year:

2010

Language:

english

File:

PDF, 2.34 MB

english, 2010

93

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Unraveling the effect of resist composition on EUV optics contamination

Pollentier, I., La Fontaine, Bruno M., Naulleau, Patrick P., Neira, I., Goethals, A.-M., Gronheid, R., Tarutani, S., Tamaoki, H., Tsubaki, H., Takahashi, T.

Year:

2011

Language:

english

File:

PDF, 415 KB

english, 2011

94

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Study of post-develop defect on typical EUV resist

Harumoto, Masahiko, La Fontaine, Bruno M., Naulleau, Patrick P., Suyama, Sadayasu, Miyagi, Tadashi, Morita, Akihiko, Asai, Masaya, Kaneyama, Koji, Itani, Toshiro

Year:

2011

Language:

english

File:

PDF, 4.26 MB

english, 2011

95

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm

Goldberg, Kenneth A., La Fontaine, Bruno M., Naulleau, Patrick P., Mochi, Iacopo, Rekawa, Senajith B., Smith, Nathan S., Macdougall, James B., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 2.00 MB

english, 2011

96

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - On the extensibility of extreme UV lithography

Yu, Shinn-Sheng, La Fontaine, Bruno M., Naulleau, Patrick P., Yen, Anthony, Chang, Shu-Hao, Shih, Chih-T'sung, Lu, Yen-Cheng, Hu, Jimmy, Wu, Timothy

Year:

2011

Language:

english

File:

PDF, 323 KB

english, 2011

97

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - CD correction for half pitch 2x-nm on extreme ultraviolet lithography

Aoyama, Hajime, La Fontaine, Bruno M., Naulleau, Patrick P., Tanaka, Yuusuke, Tawarayama, Kazuo, Arisawa, Yukiyasu, Uno, Taiga, Kamo, Takashi, Tanaka, Toshihiko, Myers, Alan, Shroff, Yashesh, Murachi,

Year:

2011

Language:

english

File:

PDF, 7.25 MB

english, 2011

98

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Acid proliferation to improve the sensitivity of EUV resists: a pulse radiolysis study

Enomoto, Kazuyuki, La Fontaine, Bruno M., Naulleau, Patrick P., Arimitsu, Koji, Yoshizawa, Atsutaro, Yamamoto, Hiroki, Oshima, Akihiro, Kozawa, Takahiro, Tagawa, Seiichi

Year:

2011

Language:

english

File:

PDF, 475 KB

english, 2011

99

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Feasibility of EUVL thin absorber mask for sub-32nm half pitch patterning

Hyun, Yoonsuk, La Fontaine, Bruno M., Naulleau, Patrick P., Park, Juntaek, Koo, Sunyoung, Kim, Yongdae, Kim, Seokkyun, Lim, Changmoon, Yim, Donggyu, Park, Sungki

Year:

2011

Language:

english

File:

PDF, 2.34 MB

english, 2011

100

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Manufacturability of 2x-nm devices with EUV tool

Tawarayama, Kazuo, La Fontaine, Bruno M., Naulleau, Patrick P., Nakajima, Yumi, Kyoh, Suigen, Aoyama, Hajime, Matsunaga, Kentaro, Magoshi, Shunko, Tanaka, Satoshi, Hayashi, Yumi, Mori, Ichiro

Year:

2011

Language:

english

File:

PDF, 4.46 MB

english, 2011

To build up a library is to create a life. It’s never just a random collection of books.

— Carlos María Domínguez

Official channel

Z-Library Desktop Launcher

Z-Library Since 2009 support@z-lib.do

EnglishРусскийEspañolItalianoελληνικάاللغة العربيةBahasa IndonesiaBahasa Malaysiaहिन्दीDeutschFrançaisPortuguêsУкраїнськаPolski中文繁體中文日本語Tiếng ViệtAzərbaycan DiliՀայոց լեզուภาษาไทยTürk Diliქართველიবাংলাپښتوతెలుగుاردو한국어SrpskiБългарски