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51

Synthesis of aluminum oxide thin films by ion beam and vapor deposition technology

K. Ogata, K. Yamaguchi, S. Kiyama, H. Hirano, S. Shimizu, M. Kohata, T. Miyano, Y. Setsuhara, S. Miyake

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1993

Language:

english

File:

PDF, 245 KB

english, 1993

52

Titanium oxide films prepared by dynamic ion mixing

Y. Setsuhara, H. Aoki, S. Miyake, A. Chayahara, M. Satou

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1993

Language:

english

File:

PDF, 199 KB

english, 1993

53

Microstructure of titanium oxide films synthesized by ion beam dynamic mixing

Y. Makino, Y. Setsuhara, S. Miyake

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1994

Language:

english

File:

PDF, 503 KB

english, 1994

54

Synthesis of (Ti, Al)N films by ion beam assisted deposition

Y. Setsuhara, T. Suzuki, Y. Makino, S. Miyake, T. Sakata, H. Mori

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1995

Language:

english

File:

PDF, 671 KB

english, 1995

55

Mechanical properties of zirconium films prepared by ion-beam assisted deposition

A. Mitsuo, T. Mori, Y. Setsuhara, S. Miyake, T. Aizawa

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

2003

Language:

english

File:

PDF, 133 KB

english, 2003

56

Interface structure between polyimide film substrate and copper film prepared by ion beam and vapor deposition (IVD) method

Akinori Ebe, Eiji Takahashi, Naoto Kuratani, Satoshi Nishiyama, Osamu Imai, Kiyoshi Ogata, Yuichi Setsuhara, Shoji Miyake

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1997

Language:

english

File:

PDF, 431 KB

english, 1997

57

Properties of depth-profile controlled boron nitride films prepared by ion-beam assisted deposition

M. Kumagai, M. Suzuki, T. Suzuki, Y. Tanaka, Y. Setsuhara, S. Miyake, K. Ogata, M. Kohata, K. Higeta, T. Einishi, Y. Suzuki, Y. Shimoitani, Y. Motonami

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1997

Language:

english

File:

PDF, 577 KB

english, 1997

58

Interfacial structure control of cubic boron nitride films prepared by ion-beam assisted deposition

Y. Setsuhara, T. Suzuki, Y. Tanaka, S. Miyake, M. Suzuki, M. Kumagai, K. Ogata, M. Kohata, K. Higeta, T. Einishi, Y. Suzuki, Y. Shimoitani, Y. Motonami

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1997

Language:

english

File:

PDF, 590 KB

english, 1997

59

Improvement of the adhesion to polyimide substrates of copper films prepared by an ion beam and vapor deposition (IVD) method

Akinori Ebe, Eiji Takahashi, Yasushi Iwamoto, Naoto Kuratani, Satoshi Nishiyama, Osamu Imai, Kiyoshi Ogata, Yuichi Setsuhara, Shoji Miyake

Journal:

Thin Solid Films

Year:

1996

Language:

english

File:

PDF, 499 KB

english, 1996

60

The 24th Symposium on Plasma Science for Materials (SPSM-24)

T. Shirafuji, Y. Setsuhara, M. Shiratani, T. Kaneko, T. Watanabe, N. Ohtake

Journal:

Thin Solid Films

Year:

2012

Language:

english

File:

PDF, 89 KB

english, 2012

61

Deposition and characterization of a- and μc-Si:H thin films by ICP-CVD system with internal antennas

Hsieh, J.H., Liang, H.C., Setsuhara, Y., Li, C.

Journal:

Surface and Coatings Technology

Year:

2013

Language:

english

File:

PDF, 885 KB

english, 2013

62

Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Takenaka, Kosuke, Setsuhara, Yuichi, Ebe, Akinori

Journal:

Japanese Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 875 KB

english, 2013

63

Characterization of inductively coupled RF plasmas for plasma-assisted mist CVD of ZnO films

Takenaka, Kosuke, Okumura, Yusuke, Setsuhara, Yuichi

Journal:

Journal of Physics Conference Series

Year:

2012

Language:

english

File:

PDF, 484 KB

english, 2012

64

Mass density control of carbon films deposited by H-assisted plasma CVD method

Urakawa, Tatsuya, Matsuzaki, Hidehumi, Yamashita, Daisuke, Uchida, Giichiro, Koga, Kazunori, Shiratani, Masaharu, Setsuhara, Yuichi, Sekine, Makoto, Hori, Masaru

Journal:

Surface and Coatings Technology

Year:

2013

Language:

english

File:

PDF, 735 KB

english, 2013

65

Plasma interaction with Zn nano layer on organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation

Cho, Ken, Takenaka, Kosuke, Setsuhara, Yuichi

Journal:

Surface and Coatings Technology

Year:

2013

Language:

english

File:

PDF, 4.00 MB

english, 2013

66

Plasma interactions with aminoacid (l-alanine) as a basis of fundamental processes in plasma medicine

Setsuhara, Yuichi, Cho, Ken, Shiratani, Masaharu, Sekine, Makoto, Hori, Masaru

Journal:

Current Applied Physics

Year:

2013

Language:

english

File:

PDF, 672 KB

english, 2013

67

Tribological Property of CeO 2 Films Prepared by Ion-Beam-Assisted Deposition

Shimizu, Ippei, Setsuhara, Yuichi, Miyake, Shoji, Musil, Jindrich, Saitou, Hidenori, Kumagai, Masao

Journal:

Japanese Journal of Applied Physics

Year:

2003

Language:

english

File:

PDF, 355 KB

english, 2003

68

Development of Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Flat Panel Display Processing

Setsuhara, Yuichi, Takenaka, Kosuke, Ebe, Akinori, Nishisaka, Kazuaki

Journal:

Solid State Phenomena

Year:

2007

Language:

english

File:

PDF, 1.48 MB

english, 2007

69

Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units

Takenaka, Kosuke, Setsuhara, Yuichi, Nishisaka, Kazuaki, Ebe, Akinori, Sugiura, Shinya, Takahashi, Kazuo, Ono, Koichi

Journal:

Japanese Journal of Applied Physics

Year:

2006

Language:

english

File:

PDF, 170 KB

english, 2006

70

Effects of Antenna Size and Configurations in Large-Area RF Plasma Production with Internal Low-Inductance Antenna Units

Deguchi, Hiroshige, Yoneda, Hitoshi, Kato, Kenji, Kubota, Kiyoshi, Hayashi, Tsukasa, Ogata, Kiyoshi, Ebe, Akinori, Takenaka, Kosuke, Setsuhara, Yuichi

Journal:

Japanese Journal of Applied Physics

Year:

2006

Language:

english

File:

PDF, 263 KB

english, 2006

71

[Japan Soc. Appl. Phys Extended Abstracts of the Second International Workshop on Junction Technology - Tokyo, Japan (29-30 Nov. 2001)] Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C) - Coherent phonon excitation as nonequilibrium dopant activation process for ultra-shallow junction formation

Setsuhara, Y., Mizuno, B., Takase, M., Hashida, M., Fuita, M., Adachi, S.

Year:

2001

Language:

english

File:

PDF, 338 KB

english, 2001

72

Characterization of Amorphous Hydrogenated Carbon Formed by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition Using Multiple Low-Inductance Antenna Units

Tsuda, Osamu, Ishihara, Masatou, Koga, Yoshinori, Fujiwara, Shuzo, Setsuhara, Yuichi, Sato, Naoyuki

Journal:

Journal of Physical Chemistry B

Year:

2005

Language:

english

File:

PDF, 414 KB

english, 2005

73

Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna

Takahashi, Eiji, Nishigami, Yasuaki, Tomyo, Atsushi, Fujiwara, Masaki, Kaki, Hirokazu, Kubota, Kiyoshi, Hayashi, Tsukasa, Ogata, Kiyoshi, Ebe, Akinori, Setsuhara, Yuichi

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 266 KB

english, 2007

74

Plasma Interactions with Organic Materials in Liquid through Plasma/Liquid Interface

Takenaka, Kosuke, Setsuhara, Yuichi

Journal:

Japanese Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 881 KB

english, 2013

75

Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna

Setsuhara, Yuichi, Miyake, Shoji, Sakawa, Yoichi, Shoji, Tatsuo

Journal:

Japanese Journal of Applied Physics

Year:

1999

Language:

english

File:

PDF, 399 KB

english, 1999

76

Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization

Yamashita, Masahiro, Setsuhara, Yuichi, Miyake, Shoji, Kumagai, Masao, Shoji, Tatsuo, Musil, Jindrich

Journal:

Japanese Journal of Applied Physics

Year:

1999

Language:

english

File:

PDF, 448 KB

english, 1999

77

Plasma-Assisted Mist Chemical Vapor Deposition of Zinc Oxide Films Using Solution of Zinc Acetate

Takenaka, Kosuke, Okumura, Yusuke, Setsuhara, Yuichi

Journal:

Japanese Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 608 KB

english, 2013

78

Characterization of Ion Energy Distribution in Inductively Coupled Argon Plasmas Sustained with Multiple Internal-Antenna Units

Takenaka, Kosuke, Setsuhara, Yuichi, Nishisaka, Kazuaki, Ebe, Akinori

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 114 KB

english, 2008

79

[Journal of the Physical Society of Japan Proceedings of the 12th Asia Pacific Physics Conference (APPC12) - Makuhari, Japan (July 14–19, 2013)] Proceedings of the 12th Asia Pacific Physics Conference (APPC12) - Effects of RF Power and Working Pressure on the Properties of Nc-Si:H Thin Films Deposited by an ICP-CVD System

Hsieh, J. H., Lai, Y. L., Li, C., Setsuhara, Y.

Year:

2014

Language:

english

File:

PDF, 488 KB

english, 2014

80

Large-area and low-damage processes for hybrid flexible device fabrications with reactive high-density plasmas driven by multiple low-inductance antenna modules

Setsuhara, Yuichi, Takenaka, Kosuke, Cho, Ken, Han, Jeon G

Journal:

Journal of Physics Conference Series

Year:

2009

Language:

english

File:

PDF, 537 KB

english, 2009

81

[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - Synthesis of microcrystalline silicon films by plasma enhanced chemical vapor deposition using multiple inductively-coupled-plasma modules with low-inductance antenna

Ebe, A., Inami, H., Baba, S., Yamamoto, N., Setsuhara, Y., Shoji, T., Miyake, S.

Year:

2002

Language:

english

File:

PDF, 71 KB

english, 2002

82

Exposure of space material insulators to energetic ions

Tahara, Hirokazu, Zhang, Lulu, Hiramatsu, Miki, Yasui, Toshiaki, Yoshikawa, Takao, Setsuhara, Yuichi, Miyake, Shoji

Journal:

Journal of Applied Physics

Year:

1995

Language:

english

File:

PDF, 755 KB

english, 1995

83

Influence of ion energy and arrival rate on x-ray crystallographic properties of thin ZrO[sub x] films prepared on Si(111) substrate by ion-beam assisted deposition

Matsuoka, M., Isotani, S., Chubaci, J. F. D., Miyake, S., Setsuhara, Y., Ogata, K., Kuratani, N.

Journal:

Journal of Applied Physics

Year:

2000

Language:

english

File:

PDF, 281 KB

english, 2000

84

[IEEE 2012 IEEE 39th International Conference on Plasma Sciences (ICOPS) - Edinburgh (2012.07.8-2012.07.13)] 2012 Abstracts IEEE International Conference on Plasma Science - Plasma etching resistance of plasma anisotropic CVD carbon films

Torigoe, R., Urakawa, T., Yamashita, D., Matsuzaki, H., Uchida, G., Koga, K., Shiratani, M., Setsuhara, Y., Sekine, M., Hori, M.

Year:

2012

Language:

english

File:

PDF, 126 KB

english, 2012

85

Etching characteristics of high-k dielectric HfO[sub 2] thin films in inductively coupled fluorocarbon plasmas

Takahashi, Kazuo, Ono, Kouichi, Setsuhara, Yuichi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2005

Language:

english

File:

PDF, 493 KB

english, 2005

86

Ultra-Large Area RF Plasma Sources Employing Multiple Low-Inductance Internal-Antenna Modules for Flat Panel Display Processing

Setsuhara, Yuichi, Takenaka, Kosuke, Tsukiyama, Daisuke, Nishisaka, Kazuaki, Ebe, Akinori

Journal:

Materials Science Forum

Year:

2007

Language:

english

File:

PDF, 698 KB

english, 2007

87

Fundamental study of ion-irradiation effects on the columnar growth of chromium films prepared by ion-beam and vapor deposition

Kuratani, Naoto, Ebe, Akinori, Ogata, Kiyoshi, Shimizu, Ippei, Setsuhara, Yuichi, Miyake, Shoji

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2001

Language:

english

File:

PDF, 719 KB

english, 2001

88

Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance

Vlček, Jaroslav, Potocký, Štěpán, Čížek, Jiří, Houška, Jiří, Kormunda, Martin, Zeman, Petr, Peřina, Vratislav, Zemek, Josef, Setsuhara, Yuichi, Konuma, Seiji

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2005

Language:

english

File:

PDF, 704 KB

english, 2005

89

[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - Development of large-scale inductively coupled plasma source with multiple internal antennas units for synthesis of microcrystalline silicon films

Baba, S., Yamamoto, N., Inami, H., Ebe, A., Setsuhara, Y., Shoji, T., Miyake, S.

Year:

2002

Language:

english

File:

PDF, 78 KB

english, 2002

90

X-ray and particle diagnostics of a high-density plasma by laser implosion (invited)

Nakai, M., Yamanaka, M., Azechi, H., Chen, Y.-W., Jitsuno, T., Katayama, M., Mima, M., Miyanaga, N., Nakaishi, H., Nakatsuka, M., Nishiguchi, A., Norreys, P. A., Setsuhara, Y., Takagi, M., Norimatsu,

Journal:

Review of Scientific Instruments

Year:

1990

Language:

english

File:

PDF, 941 KB

english, 1990

91

Characterization of porosity and dielectric constant of fluorocarbon porous films synthesized by using plasma-enhanced chemical vapor deposition and solvent process

Takahashi, Kazuo, Mitamura, Takashi, Ono, Kouichi, Setsuhara, Yuichi, Itoh, Atsushi, Tachibana, Kunihide

Journal:

Applied Physics Letters

Year:

2003

Language:

english

File:

PDF, 312 KB

english, 2003

92

High performance of compact radical monitoring probe in H[sub 2]/N[sub 2] mixture plasma

Moon, Chang Sung, Takeda, Keigo, Takashima, Seigo, Sekine, Makoto, Setsuhara, Yuichi, Shiratani, Masaharu, Hori, Masaru

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2010

Language:

english

File:

PDF, 449 KB

english, 2010

93

Magnetron sputtered Si–B–C–N films with high oxidation resistance and thermal stability in air at temperatures above 1500 °C

Vlček, Jaroslav, Hřeben, Stanislav, Kalaš, Jiří, Čapek, Jiří, Zeman, Petr, Čerstvý, Radomír, Peřina, Vratislav, Setsuhara, Yuichi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2008

Language:

english

File:

PDF, 950 KB

english, 2008

94

Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H[sub 2] and N[sub 2] mixture gases

Moon, Chang Sung, Takeda, Keigo, Takashima, Seigo, Sekine, Makoto, Setsuhara, Yuichi, Shiratani, Masaharu, Hori, Masaru

Journal:

Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 560 KB

english, 2010

95

IEEE Communications Society enhanced conference tutorials

Nakaishi, H., Miyanaga, N., Setsuhara, Y., Azechi, H., Takagi, M., Saito, M., Yamanaka, M., Yamanaka, T., Nakai, S., Kobayashi, K., Kimura, I.

Journal:

IEEE Wireless Communications

Year:

2004

Language:

english

File:

PDF, 69 KB

english, 2004

96

Direct areal density measurement by activation technique for plastic hollow shell implosion experiments

Nakaishi, H., Miyanaga, N., Setsuhara, Y., Azechi, H., Takagi, M., Saito, M., Yamanaka, M., Yamanaka, T., Nakai, S., Kobayashi, K., Kimura, I.

Journal:

Applied Physics Letters

Year:

1989

Language:

english

File:

PDF, 625 KB

english, 1989

97

Ultrathin amorphous Si layer formation by femtosecond laser pulse irradiation

Izawa, Yusaku, Izawa, Yasukazu, Setsuhara, Yuichi, Hashida, Masaki, Fujita, Masayuki, Sasaki, Ryuichiro, Nagai, Hiroyuki, Yoshida, Makoto

Journal:

Applied Physics Letters

Year:

2007

Language:

english

File:

PDF, 340 KB

english, 2007

98

[IEEE 2010 IEEE Region 10 Conference (TENCON 2010) - Fukuoka (2010.11.21-2010.11.24)] TENCON 2010 - 2010 IEEE Region 10 Conference - Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches

Nomura, T, Urakawa, T, Korenaga, Y, Yamashita, D, Matsuzaki, H, Koga, K, Shiratani, M, Setsuhara, Y, Sekine, M, Hori, M

Year:

2010

Language:

english

File:

PDF, 221 KB

english, 2010

99

[IEEE CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005. - Munich, Germany (12-17 June 2005)] CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005. - Surface modification of crystalline Si irradiated by femtosecond laser pulses

Izawaa, Yu., Fujita, M., Setsuhara, Y., Hashida, M., Izawaa, Y.

Year:

2005

Language:

english

File:

PDF, 697 KB

english, 2005

100

Influence of He Gas Flow Rate on Optical Emission Characteristics in Atmospheric Dielectric-Barrier-Discharge Plasma Jet

Uchida, Giichiro, Takenaka, Kosuke, Kawabata, Kazufumi, Setsuhara, Yuichi

Journal:

IEEE Transactions on Plasma Science

Year:

2015

Language:

english

File:

PDF, 4.09 MB

english, 2015