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51

Low-Temperature Formation of Device-Quality Polysilicon Films by cat-CVD Method

Matsumura, Hideki, Heya, Akira, Iizuka, Ritsuko, Izumi, Akira, He, An-Qiang, Otsuka, Nobuo

Journal:

MRS Proceedings

Year:

1996

Language:

english

File:

PDF, 830 KB

english, 1996

52

Cat-CVD SiN passivation films for OLEDs and packaging

Akira Heya, Toshiharu Minamikawa, Toshikazu Niki, Shigehira Minami, Atsushi Masuda, Hironobu Umemoto, Naoto Matsuo, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 770 KB

english, 2008

53

Surface Modification of Poly(ethylene naphthalate) Substrate and Its Effect on SiN x Film Deposition by Atomic Hydrogen Annealing

Heya, Akira, Matsuo, Naoto

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 219 KB

english, 2007

54

Effect of Atomic Hydrogen on Preparation of Highly Moisture-Resistive SiN x Films at Low Substrate Temperatures

Heya, Akira, Niki, Toshikazu, Takano, Masahiro, Yonezawa, Yasuto, Minamikawa, Toshiharu, Muroi, Susumu, Minami, Shigehira, Izumi, Akira, Masuda, Atsushi, Umemoto, Hironobu, Matsumura, Hideki

Journal:

Japanese Journal of Applied Physics

Year:

2004

Language:

english

File:

PDF, 213 KB

english, 2004

55

[IEEE 2015 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Kyoto, Japan (2015.7.1-2015.7.4)] 2015 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Molecular alignment control of pentacene molecules deposited on a photocrosslinkable liquid-crystalline polymer film with various thicknesses

Kondo, Mizuho, Nakanishi, Takao, Heya, Akira, Matsuo, Naoto, Kawatsuki, Nobuhiro

Year:

2015

Language:

english

File:

PDF, 1.39 MB

english, 2015

56

Dependence of electrical properties of pentacene Thin-Film Transistor on active layer thickness

Matsuo, Naoto, Heya, Akira

Journal:

IEICE Electronics Express

Year:

2011

Language:

english

File:

PDF, 499 KB

english, 2011

57

Si Atom Movement on a-Si Film Surface by Soft X-ray Excitation Using Undulators Source

Matsuo, Naoto, Takanashi, Yasuyuki, Heya, Akira, Kanda, Kazuhiro

Journal:

Journal of the Japan Institute of Metals

Year:

2009

File:

PDF, 853 KB

2009

58

Dynamics of interstitial atoms and vacancies during the crystallization of amorphous Si and Ge films by flash lamp annealing

Matsuo, Naoto, Yoshioka, Naoki, Heya, Akira

Journal:

Japanese Journal of Applied Physics

Year:

2017

Language:

english

File:

PDF, 2.57 MB

english, 2017

59

Preparation of SiNx passivation films for PZT ferroelectric capacitors at low substrate temperatures by catalytic CVD

Toshiharu Minamikawa, Yasuto Yonezawa, Akira Heya, Yoshikazu Fujimori, Takashi Nakamura, Atsushi Masuda, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 153 KB

english, 2001

60

An assessment of gastric ulcers in vivo: Enhancement of urinary recovery after oral administration of phenolsulfonphthalein in rats.

NAKAMURA, JUNZO, TAKADA, SHIGEYUKI, OHTSUKA, NOBORU, HEYA, TOSHIRO, UEDA, SATOSHI, HAMAURA, TAKESHI, YAMAMOTO, AKIRA, KIMURA, TOSHIKIRO, SEZAKI, HITOSHI

Journal:

Journal of Pharmacobio-Dynamics

Year:

1984

File:

PDF, 701 KB

1984

61

[IEEE 2020 International Conference on Electrical Machines (ICEM) - Gothenburg (2020.8.23-2020.8.26)] 2020 International Conference on Electrical Machines (ICEM) - Two-Degree-of-Freedom Actuator for Robotic Eyes

Heya, Akira, Nakata, Yoshihiro, Ishiguro, Hiroshi, Hirata, Katsuhiro

Year:

2020

File:

PDF, 862 KB

2020

62

Thermal Treatment of Ultrathin Pentacene Thin-Film Transistors

Heya, Akira, Matsuo, Naoto

Journal:

Molecular Crystals and Liquid Crystals

Year:

2015

Language:

english

File:

PDF, 611 KB

english, 2015

63

Atomic Hydrogen Annealing of Gate Dielectric in Pentacene Organic Thin-Film Transistors

HEYA, Akira, SATO, Masahiko, HASEGAWA, Hiroshi, MATSUO, Naoto

Journal:

Journal of The Surface Finishing Society of Japan

Year:

2010

Language:

english

File:

PDF, 376 KB

english, 2010

64

[IEEE 2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Kyoto, Japan (2019.7.2-2019.7.5)] 2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Atomic hydrogen annealing of AlO x /GeO x /a-Ge stack structure fabricated in oxygen atmosphere

Onuki, Tomofumi, Heya, Akira, Matsuo, Naoto

Year:

2019

File:

PDF, 1.39 MB

2019

65

[IEEE 2014 21st International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Kyoto, Japan (2014.7.2-2014.7.4)] 2014 21st International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Charge retention and conduction mechanism of DNA memory transistor

Nakamura, Shohei, Matsuo, Naoto, Yamana, Kazushige, Heya, Akira, Takada, Tadao, Fukuyama, Masataka, Yokoyama, Shin

Year:

2014

File:

PDF, 640 KB

2014

66

[IEEE 2014 21st International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Kyoto, Japan (2014.7.2-2014.7.4)] 2014 21st International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Study on graphene on pentacene structure and fabrication process

Hirano, Shun, Heya, Akira, Matsuo, Naoto

Year:

2014

Language:

english

File:

PDF, 724 KB

english, 2014

67

Structural Property of Pentacene Film Prepared by Hydrogen Chemical Transport Deposition

Heya, Akira, Hasegawa, Hiroshi, Matsuo, Naoto

Journal:

Japanese Journal of Applied Physics

Year:

2011

Language:

english

File:

PDF, 184 KB

english, 2011

68

[IEEE 2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Kyoto, Japan (2016.7.6-2016.7.8)] 2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Formation of nc-Si in SiOx by flash lamp anneling

Yoshioka, Naoki, Heya, Akira, Matuo, Naoto, Nakamura, Yousuke, Yokomori, Gakuhiko, Yoshioka, Masaki, Kohama, Kazuyuki, Ito, Kazuhiro

Year:

2016

Language:

english

File:

PDF, 1.14 MB

english, 2016

69

[IEEE 2016 IEEE/RSJ International Conference on Intelligent Robots and Systems (IROS) - Daejeon, South Korea (2016.10.9-2016.10.14)] 2016 IEEE/RSJ International Conference on Intelligent Robots and Systems (IROS) - Development of instantaneously puncture system for CT fluoroscopy-guided Interventional Radiology

Heya, Akira, Kamegawa, Tetsushi, Matsuno, Takayuki, Hiraki, Takao, Gofuku, Akio

Year:

2016

Language:

english

File:

PDF, 3.62 MB

english, 2016

70

Dynamic Modeling and Control of Three-Degree-of-Freedom Electromagnetic Actuator for Image Stabilization

Heya, Akira, Hirata, Katsuhiro, Niguchi, Noboru

Journal:

IEEE Transactions on Magnetics

Year:

2018

Language:

english

File:

PDF, 1.90 MB

english, 2018

71

[IEEE 2014 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Kyoto, Japan (2014.6.19-2014.6.20)] 2014 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Study of the conduction mechanism of the DNA memory FET

Nakamura, Shohei, Matsuo, Naoto, Yamana, Kazushige, Heya, Akira, Takada, Tadao, Fukuyama, Masataka, Yokoyama, Shin

Year:

2014

Language:

english

File:

PDF, 445 KB

english, 2014

72

Excimer Laser Annealing of Hydrogen Modulation Doped a-Si Film

Heya, Akira, Matsuo, Naoto, Serikawa, Tadashi, Kawamoto, Naoya

Journal:

MATERIALS TRANSACTIONS

Year:

2007

Language:

english

File:

PDF, 345 KB

english, 2007

73

Effects of High Nitrogen Pressure and Thermal Treatment on Adhesion to Amorphous Silicon/Silicon Nitride/Polyethersulfone Substrate during Excimer Laser Annealing

HEYA, Akira, NISHIZAKI, Shogo, KAWAMOTO, Naoya, OHDAIRA, Keisuke, MATSUMURA, Hideki, MATSUO, Naoto

Journal:

Journal of the Vacuum Society of Japan

Year:

2010

File:

PDF, 728 KB

2010

74

[IEEE 2012 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Suita, Japan (2012.05.9-2012.05.11)] 2012 IEEE International Meeting for Future of Electron Devices, Kansai - Crystallization mechanism of thick a-Si0.5Ge0.5 film by excimer laser annealing

Kino, Shota, Nonomura, Yuki, Heya, Akira, Matsuo, Naoto, Kanda, Kazuhiro, Miyamoto, Shuji, Amano, Sho, Mochizuki, Takayasu, Toko, Kaoru, Sadoh, Taizoh, Miyao, Masanobu

Year:

2012

Language:

english

File:

PDF, 161 KB

english, 2012

75

[IEEE 2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Kyoto, Japan (2015.6.4-2015.6.5)] 2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Film thickness dependence of the micro-wall solar cell with electric-field effect

Ohki, Kohei, Kusakabe, Takashi, Matsuo, Naoto, Heya, Akira

Year:

2015

Language:

english

File:

PDF, 340 KB

english, 2015

76

Surface Treatment of Plastic Substrates using Atomic Hydrogen Generated on Heated Tungsten Wire at Low Temperatures

Heya, Akira, Matsuo, Naoto

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 275 KB

english, 2007

77

Formation of highly moisture-resistive SiNx films on Si substrate by Cat-CVD at room temperature

Toshiharu Minamikawa, Akira Heya, Toshikazu Niki, Masahiro Takano, Yasuto Yonezawa, Susumu Muroi, Shigehira Minami, Atsushi Masuda, Hironobu Umemoto, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2006

Language:

english

File:

PDF, 863 KB

english, 2006

78

Anomalous grain boundary and carrier transport in cat-CVD poly-Si films

Akira Heya, An-Qiang He, Nobuo Otsuka, Hideki Matsumura

Journal:

Journal of Non-Crystalline Solids

Year:

1998

Language:

english

File:

PDF, 232 KB

english, 1998

79

[IEEE 2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Kyoto, Japan (2018.7.3-2018.7.6)] 2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Effect of atomic hydrogen annealing on AlOx/GeOx/a-Ge stack structure

Onuki, Tomofumi, Heya, Akira, Matsuo, Naoto

Year:

2018

Language:

english

File:

PDF, 1.28 MB

english, 2018

80

High-rate deposition of SiNx films over 100 nm/min by Cat-CVD method at low temperatures below 80 °C

Tetsuo Osono, Akira Heya, Toshikazu Niki, Masahiro Takano, Toshiharu Minamikawa, Susumu Muroi, Atsushi Masuda, Hironobu Umemoto, Hideki Matsumura

Journal:

Thin Solid Films

Year:

2006

Language:

english

File:

PDF, 296 KB

english, 2006

81

Structural and electrical anisotropy and high absorption in poly-Si films prepared by catalytic chemical vapor deposition

Atsushi Masuda, Ritsuko Iiduka, Akira Heya, Chisato Niikura, Hideki Matsumura

Journal:

Journal of Non-Crystalline Solids

Year:

1998

Language:

english

File:

PDF, 115 KB

english, 1998

82

[IEEE 2014 14th International Workshop on Junction Technology (IWJT) - Shanghai, China (2014.5.18-2014.5.20)] 2014 International Workshop on Junction Technology (IWJT) - Low-temperature activation of boron in silicon by soft X-ray irradiation

Heya, Akira, Matsuo, Naoto, Kanda, Kazuhiro, Noguchi, Takashi

Year:

2014

Language:

english

File:

PDF, 211 KB

english, 2014

83

[IEEE 2014 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Kyoto, Japan (2014.6.19-2014.6.20)] 2014 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Study of thin film solar cell with metal-Insulator-semiconductor diode to control carrier recombination

Wakamiya, Shota, Matsuo, Naoto, Kobayashi, Takahiro, Heya, Akira

Year:

2014

Language:

english

File:

PDF, 320 KB

english, 2014

84

Low-temperature crystallization of amorphous silicon using atomic hydrogen generated by catalytic reaction on heated tungsten

Heya, Akira, Masuda, Atsushi, Matsumura, Hideki

Journal:

Applied Physics Letters

Year:

1999

Language:

english

File:

PDF, 303 KB

english, 1999

85

[IEEE 2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Kyoto, Japan (2016.7.6-2016.7.8)] 2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Study on graphene formation by hot mesh deposition

Fuji, Satoshi, Heya, Akira, Matsuo, Naoto

Year:

2016

Language:

english

File:

PDF, 1.18 MB

english, 2016

86

[IEEE 2016 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Kyoto, Japan (2016.6.23-2016.6.24)] 2016 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Simulation and fabrication of test structure for micro-wall solar cell with electric-field effect

Kusakabe, Takashi, Matsuo, Naoto, Heya, Akira

Year:

2016

Language:

english

File:

PDF, 1.02 MB

english, 2016

87

-Deoxyribonucleic Acid/SiO2/Si Structure

Matsuo, Naoto, Takada, Tadao, Heya, Akira, Yamana, Kazushige, Sato, Tadashi, Yokoyama, Shin, Omura, Yasuhisa

Journal:

IEEE Electron Device Letters

Year:

2016

Language:

english

File:

PDF, 1.01 MB

english, 2016

88

Disk-Shaped Crystal Grain in Poly-Si Film Prepared by Excimer Laser Annealing

Heya, Akira, Kawamoto, Naoya, Matsuo, Naoto

Journal:

Journal of the Japan Institute of Metals

Year:

2012

File:

PDF, 3.11 MB

2012

89

[IEEE 2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Kyoto, Japan (2019.7.2-2019.7.5)] 2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) - Reduction and Etching of Si-Rich SiO x Film by Atomic Hydrogen Annealing

Year:

2019

Language:

english

File:

PDF, 266 KB

english, 2019

90

Highly Moisture-Resistive SiN x Films Prepared by Catalytic Chemical Vapor Deposition

Heya, Akira, Niki, Toshikazu, Yonezawa, Yasuto, Minamikawa, Toshiharu, Muroi, Susumu, Izumi, Akira, Masuda, Atsushi, Umemoto, Hironobu, Matsumura, Hideki

Journal:

Japanese Journal of Applied Physics

Year:

2004

Language:

english

File:

PDF, 187 KB

english, 2004

91

Preparation of Low-Stress SiN x Films by Catalytic Chemical Vapor Deposition at Low Temperatures

Takano, Masahiro, Niki, Toshikazu, Heya, Akira, Osono, Tetsuo, Yonezawa, Yasuto, Minamikawa, Toshiharu, Muroi, Susumu, Minami, Shigehira, Masuda, Atsushi, Umemoto, Hironobu, Matsumura, Hideki

Journal:

Japanese Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 1.72 MB

english, 2005

92

Formation of nanocrystalline silicon in SiO x by soft X-ray irradiation at low temperature

Heya, Akira, Kusakabe, Fumito, Matsuo, Naoto, Kanda, Kazuhiro, Kohama, Kazuyuki, Ito, Kazuhiro

Journal:

Japanese Journal of Applied Physics

Year:

2017

Language:

english

File:

PDF, 768 KB

english, 2017

93

(Invited) Technology Trend of Poly-Si TFT from Viewpoints of Crystallization and Device Performance

Matsuo, Naoto, Heya, Akira, Hamada, Hiroki

Journal:

ECS Transactions

Year:

2018

Language:

english

File:

PDF, 874 KB

english, 2018

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