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51

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - CD prediction by threshold energy resist model (TERM)

Yoo, Ji-Yong, Kwon, Yeong-Keun, Park, Jun-Taek, Sohn, Dong-Soo, Kim, Sang-Gon, Sohn, Young-Soo, Oh, Hye-Keun, Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 68 KB

english, 2002

52

Photoresist Exposure Parameter Extraction from Refractive Index Change during Exposure

Sohn, Young-Soo, Sung, Moon-Gyu, Lee, Young-Mi, Lee, Eun-Mi, Oh, Jin-Kyung, Byun, Sung-Hwan, Jeong, Yeon-Un, Oh, Hye-Keun, An, Ilsin, Lee, Kun-Sang, Park, In-Ho, Cho, Joon-Yeon, Lee, Sang-Ho

Journal:

Japanese Journal of Applied Physics

Year:

1998

File:

PDF, 948 KB

1998

53

[IEEE Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. - Osaka, Japan (2004.10.26-2004.10.29)] Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. - Numerical investigation of defect printability in extreme ultraviolet (EUV) reflector: Ru/Mo/Si mulitlayer system

Kaug, I., Jinho Ahn,, Hye-Keun Oh,, Yong-Chae Chung,

Year:

2004

Language:

english

File:

PDF, 348 KB

english, 2004

54

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Exposure of a halftone mask by conventional and off-axis illumination

Oh, Hye-Keun, Goo, Jung-Woung, Yim, Sug-Soon, Yoon, Tak-Hyun, Park, Seung-Wook, Nam, Byoung Sub, Kang, Hoyoung, Kim, Cheol-Hong, Han, Woo-Sung, Brunner, Timothy A.

Year:

1994

Language:

english

File:

PDF, 856 KB

english, 1994

55

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Optimum dose variation caused by post exposure bake temperature difference inside photoresist over different sublayers and thickness

Kang, Young-Min, An, Ilsin, Kim, Do Wan, Oh, Hye-Keun

Year:

2008

Language:

english

File:

PDF, 321 KB

english, 2008

56

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Aerial image characterization for the defects in the extreme ultraviolet mask

Yoo, Myoung-Sul, Mackay, R. Scott, Park, Seung-Wook, Kim, Jong-Hoi, Kwon, Yeong-Keun, Oh, Hye-Keun

Year:

2004

Language:

english

File:

PDF, 670 KB

english, 2004

57

[IEEE 2007 Digest of papers Microprocesses and Nanotechnology - Kyoto, Japan (2007.11.5-2007.11.8)] 2007 Digest of papers Microprocesses and Nanotechnology - Anisotropic resist reflow process simulation for 32 nm node elongated contact holes

Park, Joon-Min, Kim, Dai-Gyoung, Hong, Joo-Yoo, Oh, Hye-Keun

Year:

2007

Language:

english

File:

PDF, 759 KB

english, 2007

58

Vibrational Predissociation Dynamics of p-Difluorobenzene-N2 Complexes. Comparison with p-Difluorobenzene-Ar

Gilbert, Brian D., Parmenter, Charles S., Oh, Hye-Keun

Journal:

Journal of Physical Chemistry

Year:

1995

Language:

english

File:

PDF, 1.80 MB

english, 1995

59

Sensitivity of Simulation Parameter for Critical Dimension

Kim, Sang-Kon, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2002

Language:

english

File:

PDF, 258 KB

english, 2002

60

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - EUV lithography simulation for the 32nm node

Kim, Eun Jin, Lercel, Michael J., Chang, Wook, Park, Jin Back, Kim, Sung Jin, Kim, Jong Sun, Oh, Hye-Keun

Year:

2006

Language:

english

File:

PDF, 821 KB

english, 2006

61

SPIE Proceedings [SPIE Photomask Japan 2014 - Yokohama, Japan (Tuesday 15 April 2014)] Photomask and Next-Generation Lithography Mask Technology XXI - Etched multilayer mask in EUV lithography for 16 nm node and below

Kato, Kokoro, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

Year:

2014

Language:

english

File:

PDF, 687 KB

english, 2014

62

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Simple optical system parameter optimization method by comparing the critical dimension

Ha, Mi-Ae, Sohn, Dong-Soo, Jun, Kyoung-Ah, Yoo, Ji-Yong, Oh, Hye-Keun, Kim, Jaesoon, Park, In-Ho, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 767 KB

english, 2003

63

Temperature behavior of pellicles in extreme ultraviolet lithography

Hyung-Cheol Lee, Eun-Jin Kim, Ji-Won Kim, Hye-Keun Oh

Journal:

Journal of the Korean Physical Society

Year:

2012

Language:

english

File:

PDF, 154 KB

english, 2012

64

[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Prediction of resist non-uniformity caused by underlying pattern density and topology

Jin-Young Kim,, Dong-Su Son,, Eun-Jung Seo,, Young-Soo Sohn,, Heung-Jin Bak,, Hye-Keun Oh,

Year:

2000

Language:

english

File:

PDF, 125 KB

english, 2000

65

Line Edge Roughness Reduction Using Resist Reflow Process for 22 nm Node Extreme Ultraviolet Lithography

Cho, In Wook, Kim, Hyunsu, You, Jee-Hye, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 722 KB

english, 2010

66

Study of Temperature Behaviors for a Pellicle in Extreme-Ultraviolet Lithography: Mesh Structure

Kim, In-Seon, Kim, Ji-Won, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 522 KB

english, 2013

67

SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Mask error enhancement factor variation with pattern density

Kang, Hye-Young, Weed, J. Tracy, Martin, Patrick M., Kim, Sung-Hyuck, Lee, Chang-Ho, Oh, Hye-Keun

Year:

2005

Language:

english

File:

PDF, 210 KB

english, 2005

68

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Line width variation with absorber thickness in extreme ultraviolet lithography

Jeon, Young-Doo, Mackay, R. Scott, Choi, Min-Ki, Kim, Eun-Jin, Kim, Jong-Sun, Oh, Hye-Keun

Year:

2005

Language:

english

File:

PDF, 102 KB

english, 2005

69

Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process

Park, Joon-Min, Kim, Youngsang, Jeong, Heejun, An, Ilsin, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 399 KB

english, 2008

70

Heat Conduction to Photoresist on Top of Wafer during Post Exposure Bake Process: II. Application

Oh, Hye-Keun, Kim, Do Wan, Lee, Ji-Eun

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 388 KB

english, 2008

71

SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Patterning dependence on the mask defect for extreme ultraviolet lithography

Yoshioka, Nobuyuki, Ji, Hye-Rim, Kim, In-Seon, Kim, Guk-Jin, Park, Jin-Goo, Kim, Min-Su, Yeung, Micheal, Barouch, Eytan, Oh, Hye-Keun

Year:

2015

Language:

english

File:

PDF, 569 KB

english, 2015

72

A Technique for the Non-Destructive EUV Mask Sidewall Angle Measurement Using Scanning Electron Microscope

Lee, Sangheon, Lee, Junhwan, Ban, Sanghyun, Oh, Hye-Keun, Nam, Byungho, Kim, Sangpyo, Yim, Donggyu, Kim, Ohyun

Journal:

Journal of Nanoscience and Nanotechnology

Year:

2013

Language:

english

File:

PDF, 2.35 MB

english, 2013

73

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Reformulation for latent image formation model in photolithography using numerical absorbing boundary condition

Park, In-Ho, Oh, Hye-Keun, Hyun, S. B., Van den Hove, Luc

Year:

1998

Language:

english

File:

PDF, 882 KB

english, 1998

74

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - ArF photoresist parameter optimization for mask error enhancement factor reduction

Lee, Chang Ho, Sturtevant, John L., Han, Seok, Park, Kyung Sil, Kang, Hye Young, Oh, Hyun Wook, Lee, Ji Eun, Kim, Kyung Me, Kim, Young Ho, Kim, Tae Sung, Oh, Hye-Keun

Year:

2005

Language:

english

File:

PDF, 862 KB

english, 2005

75

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Effect of numerical aperture and partial coherence to the resist sidewall angle

Oh, Hye-Keun, Nam, Byoung Sub, Baek, So-Yeon, Fuller, Gene E.

Year:

1996

Language:

english

File:

PDF, 303 KB

english, 1996

76

SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Mechanical stress induced by external forces in the extreme ultraviolet pellicle

Kasprowicz, Bryan S., Buck, Peter D., Lee, Hyun-Ju, Park, Eun-Sang, Kim, In-Seon, Oh, Hye-Keun

Year:

2016

Language:

english

File:

PDF, 427 KB

english, 2016

77

[Japan Soc. of Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (29-31 Oct. 2003)] Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Effect of EUV light scattering from the rough absorber and buffer side wall

Yeong-Keun Kwon,, Jun-Taek Park,, Jong-Hoi Kim,, Byung-Cheol Cha,, Seung-Wook Park,, Ilsin An,, Hye-Keun Oh,

Year:

2003

Language:

english

File:

PDF, 48 KB

english, 2003

78

SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity

Yoshioka, Nobuyuki, Kim, In-Seon, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

Year:

2015

Language:

english

File:

PDF, 1.35 MB

english, 2015

79

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Aerial image of mesh supported extreme ultraviolet pellicle

Wood, Obert R., Panning, Eric M., Ko, Ki-ho, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Kim, Mun-Ja, Kim, Seung-Sue, Oh, Hye-Keun

Year:

2014

Language:

english

File:

PDF, 1.18 MB

english, 2014

80

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Influences of various defects on extreme ultra-violet mask

Kim, Eun-Jin, Chen, Alek C., Lin, Burn, You, Jee-Hye, Lee, Jung-Youl, Yen, Anthony, Kim, Deog-Bae, Kim, Jae-Hyun, Oh, Hye-Keun

Year:

2008

Language:

english

File:

PDF, 2.32 MB

english, 2008

81

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Evaluation of 172-nm wavelength as a possible candidate for 22-nm and below

Chen, Alek C., You, Jee-Hye, Kim, Eun-Jin, Han, Woo-Sung, Lin, Burn J., Oh, Hye-Keun, Yen, Anthony

Year:

2009

Language:

english

File:

PDF, 976 KB

english, 2009

82

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Line edge and width roughness dependency on each ingredient of extreme ultraviolet molecular resist

Kim, Hyunsu, Henderson, Clifford L., Cho, In Wook, Kim, Seong-Sue, Cho, Han-Ku, Oh, Hye-Keun

Year:

2009

Language:

english

File:

PDF, 1.02 MB

english, 2009

83

Real-Time Spectroscopic Ellipsometric Studies of Photo-Assisted Chemical Processes

An, Ilsin, Oh, Hye-Keun, Paley, M. S.

Journal:

Molecular Crystals and Liquid Crystals Science and Technology Section A Molecular Crystals and Liquid Crystals

Year:

2001

Language:

english

File:

PDF, 283 KB

english, 2001

84

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Analysis of the relation between exposure parameters and critical dimension by response surface model

Sohn, Dong-Soo, Sohn, Young-Soo, Bak, Heungin, Oh, Hye-Keun, Houlihan, Francis M.

Year:

2001

Language:

english

File:

PDF, 701 KB

english, 2001

85

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Position shift analysis in resist reflow process for sub-50-nm contact hole

You, Jee-Hye, Henderson, Clifford L., Park, Joonwoo, Park, Joon-Min, Jeong, Heejun, Oh, Hye-Keun

Year:

2009

Language:

english

File:

PDF, 583 KB

english, 2009

86

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Image and resist profile by sublayer variation in deep-UV lithography

Oh, Hye-Keun, Baek, So-Yeon, Park, Seung-Wook, Lee, Kun-Sang, Fuller, Gene E.

Year:

1996

Language:

english

File:

PDF, 301 KB

english, 1996

87

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Extraction of exposure parameters by using neural networks

Jeon, Kyoung-Ah, Kim, Hyoung-Hee, Yoo, Ji-Yong, Park, Jun-Taek, Oh, Hye-Keun, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 222 KB

english, 2003

88

Imaging performance of mesh supported pellicle for extreme ultraviolet lithography

Ko, Ki-Ho, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.71 MB

english, 2014

89

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Heat conduction from hot plate to photoresist on top of wafer including heat loss to the environment

Jung, Minhee, Kim, Sarah, Kim, Do Wan, Oh, Hye-Keun, Chen, Alek C., Han, Woo-Sung, Lin, Burn J., Yen, Anthony

Year:

2009

Language:

english

File:

PDF, 694 KB

english, 2009

90

Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector: Ru/Mo/Si Multilayer System

Kang, In-Yong, Ahn, Jinho, Oh, Hye-Keun, Chung, Yong-Chae

Journal:

Japanese Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 113 KB

english, 2005

91

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Design for Manufacturability through Design-Process Integration V - The effective etch process proximity correction methodology for improving on chip CD variation in 20 nm node DRAM gate

Park, Jeong-Geun, Rieger, Michael L., Kim, Sang-wook, Shim, Seong-Bo, Suh, Sung-Soo, Oh, Hye-Keun

Year:

2011

Language:

english

File:

PDF, 3.45 MB

english, 2011

92

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Resist distribution effect of spin coating

Kim, Sang-Kon, Yoo, Ji-Yong, Oh, Hye-Keun, Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 82 KB

english, 2002

93

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Exposure simulation of electron beam microcolumn lithography

Kim, Sang-Kon, Mackay, R. Scott, Oh, Hye-Keun

Year:

2004

Language:

english

File:

PDF, 268 KB

english, 2004

94

[IEEE Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (2005.10.25-2005.10.28)] Digest of Papers Microprocesses and Nanotechnology 2005 - Aerial image characteristics of modified absorber model for extreme ultraviolet lithography (EUVL)

In-Yong Kang,, Jinho Ahn,, Hye-Keun Oh,, Yong-Chae Chung,

Year:

2005

Language:

english

File:

PDF, 776 KB

english, 2005

95

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - 32 nm half pitch formation with high numerical aperture single exposure

Jung, Minhee, Levinson, Harry J., Dusa, Mircea V., Park, Joon-Min, Kim, Moonseok, Hong, Sukjoon, Kim, Jaisoon, Park, In-Ho, Oh, Hye-Keun

Year:

2009

Language:

english

File:

PDF, 335 KB

english, 2009

96

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - 32 nm 1:1 line and space patterning by resist reflow process

Park, Joon-Min, Jeong, Heejun, An, Ilsin, Oh, Hye-Keun

Year:

2008

Language:

english

File:

PDF, 1.20 MB

english, 2008

97

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Temperature and critical dimension variation in a single wafer on hot plate due to non-uniform heat source

Kim, Bobae, Henderson, Clifford L., Park, Joon-Min, Kim, Hyunsu, An, Ilsin, Park, Seung-Wook, Oh, Hye-Keun

Year:

2009

Language:

english

File:

PDF, 8.31 MB

english, 2009

98

Chromeless Phase Lithography Using Scattering Bars and Zebra Patterns

Kang, Hye-Young, An, Ilsin, Shin, Dong-Soo, Jeong, HeeJun, Ahn, Chang-Nam, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2006

Language:

english

File:

PDF, 248 KB

english, 2006

99

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - ArF photoresist parameter optimization for mask error enhancement factor reduction

Lee, Chang H., Komuro, Masanori, Han, Seok, Park, Kyoung S., Yoon, Sangwoong, Kang, Hye Y., Oh, Hyun W., Lee, Ji E., Kim, Young H., Kim, Tae S., Oh, Hye-Keun

Year:

2005

Language:

english

File:

PDF, 637 KB

english, 2005

100

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - 22nm 1:1 line and space patterning by using double patterning and resist reflow process

Park, Joon Min, Chen, Alek C., Lin, Burn, Yoo, Ji-Hye, Hong, Joo-Yoo, Yen, Anthony, An, Ilsin, Oh, Hye-Keun

Year:

2008

Language:

english

File:

PDF, 752 KB

english, 2008

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