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51

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Improving chemically amplified resist modeling for 2D layout patterns

Yuan, Lei, Neureuther, Andrew R., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 673 KB

english, 2003

52

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Polymer photochemistry at the EUV wavelength

Fedynyshyn, Theodore H., Allen, Robert D., Goodman, Russell B., Cabral, Alberto, Tarrio, Charles, Lucatorto, Thomas B.

Year:

2010

Language:

english

File:

PDF, 486 KB

english, 2010

53

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Characterization of the polymer-developer interface in 193-nm photoresist polymers and formulations during dissolution

Wallow, Thomas I., Chan, Wendy, Hinsberg, William D., Lee, Seok-Won, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 721 KB

english, 2002

54

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Effects of alkali treatment on ArF resist process

Kim, Jin-Soo, Fedynyshyn, Theodore H., Jung, Jae-Chang, Kong, Keun-Kyu, Kim, Hyoung-Ryeun, Kim, Hyeong-Soo

Year:

2003

Language:

english

File:

PDF, 775 KB

english, 2003

55

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Trace metal removal from microlithography process chemicals: Part I. photoresist solvents

Tseng, Hsiao-Show M., Ling, Xiaoping, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 182 KB

english, 2002

56

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Building high-performance chemically amplified resists with polymer blends

Lin, Qinghuang, Fedynyshyn, Theodore H., Simons, John P., Angelopoulos, Marie, Sooriyakumaran, Ratnam

Year:

2002

Language:

english

File:

PDF, 597 KB

english, 2002

57

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Line-edge roughness reduction for advanced metal gate etch with 193-nm lithography in a silicon decoupled plasma source etcher (DPSII)

Chowdhury, Tito, Fedynyshyn, Theodore H., Bamnolker, Hanna, Khen, Roni, Yang, Chan-Lon, Lee, Hean-Cheal, Du, Yan, Shen, Meihua, Choi, Jinhan, Deshmukh, Shashank

Year:

2003

Language:

english

File:

PDF, 788 KB

english, 2003

58

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Component segregation in model chemically amplified resists

Woodward, John T., Lin, Qinghuang, Fedynyshyn, Theodore H., Astolfi, David K., Cann, Susan, Roberts, Jeanette M., Leeson, Michael J.

Year:

2007

Language:

english

File:

PDF, 1.04 MB

english, 2007

59

The Development of Chemically Amplified Positive- and Negative-tone Resists for DUV Lithography.

Thackeray, James W., Adams, Timothy, Cronin, Michael F., Denison, Mark, Fedynyshyn, Theodore H., Georger, Jacque, Mori, J. Michael, Orsula, George W., Sinta, Roger

Journal:

Journal of Photopolymer Science and Technology

Year:

1994

Language:

english

File:

PDF, 646 KB

english, 1994

60

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Successful photoresist removal: incorporating chemistry, conditions, and equipment

Moore, John C., Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 307 KB

english, 2002

61

Rearrangements of 3-heterobicyclo[3.2.0]hept-6-enes

Arthur G. Schultz, Theodore H. Fedynyshyn

Journal:

Year:

1982

Language:

english

File:

PDF, 349 KB

english, 1982

62

Sub-0.5 micron lithography with i-line acid-hardened negative resists

M.T. Allen, G.S. Calabrese, T.H. Fedynyshyn, A.A. Lamola, R.D. Small

Journal:

Microelectronic Engineering

Year:

1992

Language:

english

File:

PDF, 322 KB

english, 1992

63

The effect of diffusion, reaction order, and developer selectivity on the performance of positive DUV resists

T.H. Fedynyshyn, J.W. Thackeray, J.M. Mori

Journal:

Microelectronic Engineering

Year:

1994

Language:

english

File:

PDF, 544 KB

english, 1994

64

Fluorine—an enabler in advanced photolithography

M. Rothschild, T.M. Bloomstein, T.H. Fedynyshyn, V. Liberman, W. Mowers, R. Sinta, M. Switkes, A. Grenville, K. Orvek

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 456 KB

english, 2003

65

Synthesis of anhydrosibiromycinone: a new method for the direct synthesis of pyrrolo-1,4-benzodiazepin-5-ones

Kathlyn A. Parker, Theodore H. Fedynyshyn

Journal:

Tetrahedron Letters

Year:

1979

Language:

english

File:

PDF, 218 KB

english, 1979

66

Optimization of multiplexed bead-based cytokine immunoassays for rat serum and brain tissue

R.E Hulse, P.E Kunkler, J.P Fedynyshyn, R.P Kraig

Journal:

Journal of Neuroscience Methods

Year:

2004

Language:

english

File:

PDF, 308 KB

english, 2004

67

Plasma concentrations of VCAM-1 and PAI-1: A predictive biomarker for post-operative recurrence in colorectal cancer

Yasuhide Yamada, Tokuzo Arao, Kazuko Matsumoto, Vinita Gupta, Woei Tan, Joe Fedynyshyn, Takako E. Nakajima, Yasuhiro Shimada, Tetsuya Hamaguchi, Ken Kato, Hirokazu Taniguchi, Yutaka Saito, Takahisa Ma

Journal:

Year:

2010

Language:

english

File:

PDF, 169 KB

english, 2010

68

Encapsulation of Nanosized Silica by in Situ Polymerization of tert-Butyl Acrylate Monomer†

Sondi, Ivan, Fedynyshyn, Theodore H., Sinta, Roger, Matijević, Egon

Journal:

Year:

2000

Language:

english

File:

PDF, 75 KB

english, 2000

69

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry

Burns, Sean D., Schmid, Gerard M., Trinque, Brian C., Willson, James, Wunderlich, Jennifer, Tsiartas, Pavlos C., Taylor, James C., Burns, Ryan L., Wilson, C. Grant, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 200 KB

english, 2003

70

Development and Validation of a Novel Ig Isotyping Assay on Magnetic Microspheres

Candice Reyes, Joe Fedynyshyn, Sophie Allauzen

Journal:

Clinical Immunology

Year:

2007

Language:

english

File:

PDF, 42 KB

english, 2007

71

DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing

W.H. Bruenger, H. Buschbeck, E. Cekan, S. Eder, T.H. Fedynyshyn, W.G. Hertlein, P. Hudek, I. Kostic, H. Loeschner, I.W. Rangelow, M. Torkler

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 306 KB

english, 1998

72

Mu-type opioid receptors in rat periaqueductal gray-enriched P2 membrane are coupled to guanine nucleotide binding proteins

Joseph P. Fedynyshyn, Nancy M. Lee

Journal:

Year:

1989

Language:

english

File:

PDF, 563 KB

english, 1989

73

Characterization of high affinity opioid binding sites in rat periaqueductal gray P2 membrane

Joseph P. Fedynyshyn, Geoffrey Kwiat, Nancy M. Lee

Journal:

European Journal of Pharmacology

Year:

1989

Language:

english

File:

PDF, 468 KB

english, 1989

74

μ type opioid receptors in rat periaqueductal gray-enriched P2 membrane are coupled to G-protein-mediated inhibition of adenylyl cyclase

J.P. Fedynyshyn, N.M. Lee

Journal:

Year:

1989

Language:

english

File:

PDF, 457 KB

english, 1989

75

Message and protein-level elevation of tumor necrosis factor α (TNFα) and TNFα-modulating cytokines in spinal cords of the G93A-SOD1 mouse model for amyotrophic lateral sclerosis

Kenneth Hensley, Joe Fedynyshyn, Scott Ferrell, Robert A Floyd, Brian Gordon, Paula Grammas, Ladan Hamdheydari, Molina Mhatre, Shenyun Mou, Quentin N Pye, Charles Stewart, Melinda West, Stuart West, K

Journal:

Neurobiology of Disease

Year:

2003

Language:

english

File:

PDF, 142 KB

english, 2003

76

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Sub-100 nm T-gates utilizing a single E-beam lithography exposure process

Ainley, Eric S., Ageno, Scott, Nordquist, Kevin J., Resnick, Douglas J., Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 541 KB

english, 2002

77

A Universal Method for Detection of Amyloidogenic Misfolded Proteins

Yam, Alice Y., Wang, Xuemei, Gao, Carol Man, Connolly, Michael D., Zuckermann, Ronald N., Bleu, Thieu, Hall, John, Fedynyshyn, Joseph P., Allauzen, Sophie, Peretz, David, Salisbury, Cleo M.

Journal:

Year:

2011

Language:

english

File:

PDF, 2.26 MB

english, 2011

78

Nanopatterning with UV Optical Lithography

Rothschild, M., Bloomstein, T. M., Efremow, N., Fedynyshyn, T. H., Fritze, M., Pottebaum, I., Switkes, M.

Journal:

Year:

2005

Language:

english

File:

PDF, 270 KB

english, 2005

79

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - 100-nm generation contact patterning by low temperature 193-nm resist reflow process

Van Driessche, Veerle, Lucas, Kevin, Van Roey, Frieda, Grozev, Grozdan, Tzviatkov, Plamen, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 552 KB

english, 2002

80

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Resist reflow for 193-nm low-K1 lithography contacts

Montgomery, Patrick K., Lucas, Kevin, Strozewski, Kirk J., Zavyalova, Lena, Grozev, Grozdan, Reybrouck, Mario, Tzviatkov, Plamen, Maenhoudt, Mireille, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 486 KB

english, 2003

81

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - High-sensitivity nanocomposite resist materials for x-ray and EUV lithography

Ali, Mohammad Azam, Gonsalves, Kenneth E., Batina, N., Golovkina, Victoria, Cerrina, Franco, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 523 KB

english, 2003

82

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Koh, Meiten, Ishikawa, Takuji, Toriumi, Minoru, Araki, Takayuki, Yamashita, Tsuneo, Aoyama, Hirokazu, Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 300 KB

english, 2003

83

The Effect of Aluminum vs. Photoresist Masking on the Etching Rates of Silicon and Silicon Dioxide in CF[sub 4]∕O[sub 2] Plasmas

Fedynyshyn, Theodore H.

Journal:

Journal of The Electrochemical Society

Year:

1987

Language:

english

File:

PDF, 469 KB

english, 1987

84

Detection of Abeta oligomers in Alzheimer's disease patient CSF with a novel misfolded protein assay

Gao, Carol Man, Fedynyshyn, Joseph P, Magdangal, Erika, Yam, Alice, Blennow, Kaj, Wang, Xuemei, Salisbury, Cleo M, Allauzen, Sophie

Journal:

Alzheimer's & Dementia

Year:

2010

Language:

english

File:

PDF, 48 KB

english, 2010

85

Effect of acid diffusion on performance in positive deep ultraviolet resists

Fedynyshyn, T. H.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1994

Language:

english

File:

PDF, 974 KB

english, 1994

86

Polymer photochemistry at advanced optical wavelengths

Fedynyshyn, Theodore H., Kunz, Roderick R., Sinta, Roger F., Goodman, Russell B., Doran, Scott P.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2000

Language:

english

File:

PDF, 921 KB

english, 2000

87

[IEEE 2007 IEEE International Conference on Systems, Man and Cybernetics - Montreal, QC, Canada (2007.10.7-2007.10.10)] 2007 IEEE International Conference on Systems, Man and Cybernetics - Enhancing embodied evolution with punctuated anytime learning

Parker, Gary B., Fedynyshyn, Gregory E.

Year:

2007

Language:

english

File:

PDF, 367 KB

english, 2007

88

The relationship between critical dimension shift and diffusion in negative chemically amplified resist systems

Fedynyshyn, Theodore H.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1991

Language:

english

File:

PDF, 1.00 MB

english, 1991

89

Process optimization of the advanced negative electron beam resist SAL605

T. H. Fedynyshyn

Year:

1990

Language:

english

File:

PDF, 923 KB

english, 1990

90

Mask Dependent Etch Rates II

Fedynyshyn, Theodore H.

Journal:

Journal of The Electrochemical Society

Year:

1987

Language:

english

File:

PDF, 749 KB

english, 1987

91

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Performance of imide and methide onium PAGs in 193-nm resist formulations

Padmanaban, Munirathna, Dammel, Ralph R., Lee, SangHo, Kim, Woo-Kyu, Kudo, Takanori, McKenzie, Douglas S., Rahman, Dalil, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 916 KB

english, 2003

92

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Methods for comparing contact hole shrinking techniques with 248-nm single layer and bilayer photoresists

Petrillo, Karen E., Simons, John P., DellaGuardia, Ronald, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 306 KB

english, 2002

93

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - PAG segregation during exposure affecting innate material roughness

Fedynyshyn, Theodore H., Astolfi, David K., Cabral, Alberto, Roberts, Jeanette, Lin, Qinghuang

Year:

2007

Language:

english

File:

PDF, 537 KB

english, 2007

94

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Negative-tone CAR resists for e-beam lithography: modification of chemical composition for R&D application (high resolution) or production application (high sensitivity)

Charpin, Murielle, Pain, Laurent, Tedesco, Serge V., Gourgon, C., Andrei, A., Henry, Daniel, LaPlanche, Yves, Hanawa, Ryotaro, Kusumoto, Tadashi, Suetsugu, Masumi, Yokoyama, H., Fedynyshyn, Theodore H

Year:

2002

Language:

english

File:

PDF, 1.21 MB

english, 2002

95

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Spatial frequency analysis of line-edge roughness in nine chemically related photoresists

Lawrence, William, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 1.25 MB

english, 2003

96

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Spin coating and photolithography using liquid and supercritical carbon dioxide

Hoggan, Erik N., Flowers, Devin, DeSimone, Joseph M., Carbonell, Ruben G., Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 255 KB

english, 2002

97

Mask Dependent Etch Rates III

Fedynyshyn, T. H.

Journal:

Journal of The Electrochemical Society

Year:

1988

Language:

english

File:

PDF, 185 KB

english, 1988

98

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Characterization of an ultra-thick positive photoresist for electroplating applications

Flack, Warren W., Nguyen, Ha-Ai, Capsuto, Elliott S., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 1.07 MB

english, 2003

99

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Ultra-thick lithography for advanced packaging and MEMS

Brubaker, Chad, Islam, Rafiqul, Luesebrink, Helge, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 169 KB

english, 2002

100

The Effect of Metal Masks on the Plasma Etch Rate of Silicon

Fedynyshyn, Theodore H.

Journal:

Journal of The Electrochemical Society

Year:

1989

Language:

english

File:

PDF, 1009 KB

english, 1989