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1

Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability

Dendooven, J., Deduytsche, D., Musschoot, J., Vanmeirhaeghe, R. L., Detavernier, C.

Journal:

Journal of The Electrochemical Society

Year:

2009

Language:

english

File:

PDF, 216 KB

english, 2009

2

Reactor concepts for atomic layer deposition on agitated particles: A review

Longrie, Delphine, Deduytsche, Davy, Detavernier, Christophe

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2014

Language:

english

File:

PDF, 2.25 MB

english, 2014

3

Crystallization and semiconductor-metal switching behavior of thin VO2 layers grown by atomic layer deposition

Rampelberg, Geert, Deduytsche, Davy, De Schutter, Bob, Premkumar, Peter Antony, Toeller, Michael, Schaekers, Marc, Martens, Koen, Radu, Iuliana, Detavernier, Christophe

Journal:

Thin Solid Films

Year:

2014

Language:

english

File:

PDF, 1.89 MB

english, 2014

4

Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma

Qi Xie, Jan Musschoot, Christophe Detavernier, Davy Deduytsche, Roland L Van Meirhaeghe, Sven Van den Berghe, Yu-Long Jiang, Guo-Ping Ru, Bing-Zong Li, Xin-Ping Qu

Journal:

Microelectronic Engineering

Year:

2008

Language:

english

File:

PDF, 1.18 MB

english, 2008

5

Atomic layer deposition of titanium nitride from TDMAT precursor

J. Musschoot, Q. Xie, D. Deduytsche, S. Van den Berghe, R.L. Van Meirhaeghe, C. Detavernier

Journal:

Microelectronic Engineering

Year:

2009

Language:

english

File:

PDF, 434 KB

english, 2009

6

Semiconductor-metal transition in thin VO[sub 2] films grown by ozone based atomic layer deposition

Rampelberg, Geert, Schaekers, Marc, Martens, Koen, Xie, Qi, Deduytsche, Davy, De Schutter, Bob, Blasco, Nicolas, Kittl, Jorge, Detavernier, Christophe

Journal:

Applied Physics Letters

Year:

2011

Language:

english

File:

PDF, 809 KB

english, 2011

7

[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality

Detavernier, Christophe, Dendooven, Jolien, Deduytsche, Davy, Musschoot, Jan

Year:

2008

Language:

english

File:

PDF, 333 KB

english, 2008

8

[IEEE 2008 9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT) - Beijing, China (2008.10.20-2008.10.23)] 2008 9th International Conference on Solid-State and Integrated-Circuit Technology - Comparison of the Ru thin films grown on Si, TiN/Si and TaN/Si substrates by plasma enhanced atomic layer deposition

Xie, Qi, Musschoot, Jan, Detavernier, Christophe, Deduytsche, Davy, Van Meirhaeghe, Roland L., Jiang, Yu-Long, Ru, Guo-Ping, Li, Bing-Zong, Qu, Xin-Ping

Year:

2008

Language:

english

File:

PDF, 2.62 MB

english, 2008

9

The effect of sputtered W-based carbide diffusion barriers on the thermal stability and void formation in copper thin films

Qi Xie, Yu-Long Jiang, Keon De Keyser, Christophe Detavernier, Davy Deduytsche, Guo-Ping Ru, Xin-Ping Qu, K.N. Tu

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 1.03 MB

english, 2010

10

In situ X-ray diffraction study of thin film Ir/Si solid state reactions

W. Knaepen, J. Demeulemeester, D. Deduytsche, J.L. Jordan-Sweet, A. Vantomme, R.L. Van Meirhaeghe, C. Detavernier, C. Lavoie

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 694 KB

english, 2010

11

Texture of atomic layer deposited ruthenium

J. Musschoot, Q. Xie, D. Deduytsche, K. De Keyser, D. Longrie, J. Haemers, S. Van den Berghe, R.L. Van Meirhaeghe, J. D’Haen, C. Detavernier

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 502 KB

english, 2010

12

TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition

Qi Xie, Davy Deduytsche, Jan Musschoot, Roland L. Van Meirhaeghe, Christophe Detavernier, Shao-Feng Ding, Xin-Ping Qu

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 1.20 MB

english, 2011

13

Ru thin film grown on TaN by plasma enhanced atomic layer deposition

Qi Xie, Yu-Long Jiang, Jan Musschoot, Davy Deduytsche, Christophe Detavernier, Roland L. Van Meirhaeghe, Sven Van den Berghe, Guo-Ping Ru, Bing-Zong Li, Xin-Ping Qu

Journal:

Thin Solid Films

Year:

2009

Language:

english

File:

PDF, 978 KB

english, 2009

14

Germanium surface passivation and atomic layer deposition of high- k dielectrics—a tutorial review on Ge-based MOS capacitors

Xie, Qi, Deng, Shaoren, Schaekers, Marc, Lin, Dennis, Caymax, Matty, Delabie, Annelies, Qu, Xin-Ping, Jiang, Yu-Long, Deduytsche, Davy, Detavernier, Christophe

Journal:

Semiconductor Science and Technology

Year:

2012

Language:

english

File:

PDF, 2.15 MB

english, 2012

15

Anisotropic Atomic Layer Deposition Profiles of TiO 2 in Hierarchical Silica Material with Multiple Porosity

Pulinthanathu Sree, Sreeprasanth, Dendooven, Jolien, Jammaer, Jasper, Masschaele, Kasper, Deduytsche, Davy, D’Haen, Jan, Kirschhock, Christine E. A., Martens, Johan A., Detavernier, Christophe

Journal:

Chemistry of Materials

Year:

2012

Language:

english

File:

PDF, 2.20 MB

english, 2012

16

Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

J. Musschoot, J. Dendooven, D. Deduytsche, J. Haemers, G. Buyle, C. Detavernier

Journal:

Surface and Coatings Technology

Year:

2012

Language:

english

File:

PDF, 1.12 MB

english, 2012

17

A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Delphine Longrie, Davy Deduytsche, Jo Haemers, Kris Driesen, Christophe Detavernier

Journal:

Surface and Coatings Technology

Year:

2012

Language:

english

File:

PDF, 1.28 MB

english, 2012

18

Plasma-Enhanced ALD of Platinum with O2, N2 and NH3 Plasmas

Longrie, D., Devloo-Casier, K., Deduytsche, D., Van den Berghe, S., Driesen, K., Detavernier, C.

Journal:

ECS Journal of Solid State Science and Technology

Year:

2012

Language:

english

File:

PDF, 1.37 MB

english, 2012

19

In Situ X-ray Fluorescence Measurements During Atomic Layer Deposition: Nucleation and Growth of TiO 2 on Planar Substrates and in Nanoporous Films

Dendooven, Jolien, Pulinthanathu Sree, Sreeprasanth, De Keyser, Koen, Deduytsche, Davy, Martens, Johan A., Ludwig, Karl F., Detavernier, Christophe

Journal:

The Journal of Physical Chemistry C

Year:

2011

Language:

english

File:

PDF, 3.80 MB

english, 2011

20

High-Performance Ge MOS Capacitors by $\hbox{O}_{2}$ Plasma Passivation and $\hbox{O}_{2}$ Ambient Annealing

Xie, Qi, Deng, Shaoren, Schaekers, Marc, Lin, Dennis, Caymax, Matty, Delabie, Annelies, Jiang, Yulong, Qu, Xinping, Deduytsche, Davy, Detavernier, Christophe

Journal:

IEEE Electron Device Letters

Year:

2011

Language:

english

File:

PDF, 281 KB

english, 2011

21

A Single-Event MicroKinetic assessment of n-alkane hydroconversion on ultrastable Y zeolites after Atomic Layer Deposition of alumina

Vandegehuchte, B.D., Thybaut, J.W., Detavernier, C., Deduytsche, D., Dendooven, J., Martens, J.A., Sree, S.P., Korányi, T.I., Marin, G.B.

Journal:

Journal of Catalysis

Year:

2014

Language:

english

File:

PDF, 1.09 MB

english, 2014

22

Study of Schottky barrier height modulation for NiSi/Si contact with an antimony interlayer

Guo, Xiao, Tang, Yang, Jiang, Yu-Long, Qu, Xin-Ping, Ru, Guo-Ping, Zhang, David Wei, Deduytsche, Davy, Detavernier, Christophe

Journal:

Microelectronic Engineering

Year:

2013

Language:

english

File:

PDF, 914 KB

english, 2013

23

Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing

Deng, Shaoren, Verbruggen, Sammy W., Lenaerts, Silvia, Martens, Johan A., Van den Berghe, Sven, Devloo-Casier, Kilian, Devulder, Wouter, Dendooven, Jolien, Deduytsche, Davy, Detavernier, Christophe

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2014

Language:

english

File:

PDF, 2.47 MB

english, 2014

24

Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH 3 on Particles Agitated in a Rotary Reactor

Longrie, Delphine, Deduytsche, Davy, Haemers, Jo, Smet, Philippe F., Driesen, Kris, Detavernier, Christophe

Journal:

ACS Applied Materials & Interfaces

Year:

2014

Language:

english

File:

PDF, 3.99 MB

english, 2014

25

Atomic layer deposition of TiO[sub 2] from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H[sub 2]O

Xie, Qi, Jiang, Yu-Long, Detavernier, Christophe, Deduytsche, Davy, Van Meirhaeghe, Roland L., Ru, Guo-Ping, Li, Bing-Zong, Qu, Xin-Ping

Journal:

Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 358 KB

english, 2007

26

Spacious and mechanically flexible mesoporous silica thin film composed of an open network of interlinked nanoslabs

Sree, Sreeprasanth Pulinthanathu, Dendooven, Jolien, Smeets, Dries, Deduytsche, Davy, Aerts, Alexander, Vanstreels, Kris, Baklanov, Mikhail R., Seo, Jin Won, Temst, Kristiaan, Vantomme, André, Detaver

Journal:

Journal of Materials Chemistry

Year:

2011

Language:

english

File:

PDF, 514 KB

english, 2011

27

Aluminium atomic layer deposition applied to mesoporous zeolites for acid catalytic activity enhancement

Sree, Sreeprasanth Pulinthanathu, Dendooven, Jolien, Korányi, Tamás I., Vanbutsele, Gina, Houthoofd, Kristof, Deduytsche, Davy, Detavernier, Christophe, Martens, Johan A.

Journal:

Catalysis Science & Technology

Year:

2011

Language:

english

File:

PDF, 683 KB

english, 2011

28

Conformality of Al[sub 2]O[sub 3] and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition

Dendooven, J., Deduytsche, D., Musschoot, J., Vanmeirhaeghe, R. L., Detavernier, C.

Journal:

Journal of The Electrochemical Society

Year:

2010

Language:

english

File:

PDF, 342 KB

english, 2010

29

Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions

Opsomer, K., Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Lauwers, A., Maex, K., Lavoie, C.

Journal:

Applied Physics Letters

Year:

2007

Language:

english

File:

PDF, 469 KB

english, 2007

30

Room-temperature grain growth in sputter-deposited Cu films

Detavernier, C., Deduytsche, D., Van Meirhaeghe, R. L., De Baerdemaeker, J., Dauwe, C.

Journal:

Applied Physics Letters

Year:

2003

Language:

english

File:

PDF, 542 KB

english, 2003

31

High-temperature degradation of NiSi films: Agglomeration versus NiSi[sub 2] nucleation

Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Lavoie, C.

Journal:

Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 1.32 MB

english, 2005

32

Effective reduction of fixed charge densities in germanium based metal-oxide-semiconductor devices

Deng, Shaoren, Xie, Qi, Deduytsche, Davy, Schaekers, Marc, Lin, Dennis, Caymax, Matty, Delabie, Annelies, Van den Berghe, Sven, Qu, Xinping, Detavernier, Christophe

Journal:

Applied Physics Letters

Year:

2011

Language:

english

File:

PDF, 642 KB

english, 2011

33

Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition

Xie, Qi, Musschoot, Jan, Deduytsche, Davy, Van Meirhaeghe, Roland L., Detavernier, Christophe, Van den Berghe, Sven, Jiang, Yu-Long, Ru, Guo-Ping, Li, Bing-Zong, Qu, Xin-Ping

Journal:

Journal of The Electrochemical Society

Year:

2008

Language:

english

File:

PDF, 819 KB

english, 2008

34

Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers

Rampelberg, Geert, Devloo-Casier, Kilian, Deduytsche, Davy, Schaekers, Marc, Blasco, Nicolas, Detavernier, Christophe

Journal:

Applied Physics Letters

Year:

2013

Language:

english

File:

PDF, 1.51 MB

english, 2013

35

Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions

Roy, Amit K., Deduytsche, Davy, Detavernier, Christophe

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2013

Language:

english

File:

PDF, 1.36 MB

english, 2013

36

Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements

Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Jordan-Sweet, J. L., Lavoie, C.

Journal:

Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 754 KB

english, 2007

37

Implementing TiO[sub 2] as gate dielectric for Ge-channel complementary metal-oxide-semiconductor devices by using HfO[sub 2]/GeO[sub 2] interlayer

Xie, Qi, Deduytsche, Davy, Schaekers, Marc, Caymax, Matty, Delabie, Annelies, Qu, Xin-Ping, Detavernier, Christophe

Journal:

Applied Physics Letters

Year:

2010

Language:

english

File:

PDF, 558 KB

english, 2010

38

Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots

Smeets, D., Demeulemeester, J., Deduytsche, D., Detavernier, C., Comrie, C. M., Theron, C. C., Lavoie, C., Vantomme, A.

Journal:

Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 562 KB

english, 2008

39

Effective Electrical Passivation of Ge(100) for HfO2 Gate Dielectric Layers Using O2 Plasma

Xie, Qi, Deduytsche, Davy, Schaekers, Marc, Caymax, Matty, Delabie, Annelies, Qu, Xin-Ping, Detavernier, Christophe

Journal:

Electrochemical and Solid-State Letters

Year:

2011

Language:

english

File:

PDF, 628 KB

english, 2011

40

[ECS 216th ECS Meeting - Vienna, Austria (October 4 - October 9, 2009)] ECS Transactions - ALD of Vanadium Oxide

Musschoot, Jan, Deduytsche, Davy, Van Meirhaeghe, Roland L., Detavernier, Christophe

Year:

2009

Language:

english

File:

PDF, 415 KB

english, 2009

41

Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide

Musschoot, J., Deduytsche, D., Poelman, H., Haemers, J., Van Meirhaeghe, R. L., Van den Berghe, S., Detavernier, C.

Journal:

Journal of The Electrochemical Society

Year:

2009

Language:

english

File:

PDF, 662 KB

english, 2009

42

Effect of Pt addition on growth stress and thermal stress of NiSi films

C. Van Bockstael, K. De Keyser, D. Deduytsche, R. L. Van Meirhaeghe, C. Detavernier, J. L. Jordan-sweet, C. Lavoie

Year:

2008

Language:

english

File:

PDF, 1.13 MB

english, 2008

43

Fermi Level Depinning Failure for Al/GeO2/Ge Contacts

Yu, H., Xie, Q., Jiang, Y.-L., Deduytsche, D., Detavernier, C.

Journal:

ECS Solid State Letters

Year:

2012

Language:

english

File:

PDF, 902 KB

english, 2012

44

[ECS 210th ECS Meeting - Cancun, Mexico (October 29-November 3, 2006)] ECS Transactions - Influence of Alloying Elements on the Formation and Stability of NiSi

Detavernier, Christophe, Deduytsche, Davy, Jordan-Sweet, Jean, Cabral, Cyril, Lavoie, Christian

Year:

2006

Language:

english

File:

PDF, 3.55 MB

english, 2006

45

Combinatorial Study of Ag–Te Thin Films and Their Application as Cation Supply Layer in CBRAM Cells

Devulder, Wouter, Opsomer, Karl, Meersschaut, Johan, Deduytsche, Davy, Jurczak, Malgorzata, Goux, Ludovic, Detavernier, Christophe

Journal:

ACS Combinatorial Science

Year:

2015

Language:

english

File:

PDF, 4.35 MB

english, 2015

46

Annealing induced hysteresis suppression for TiN/HfO 2 /GeON/p-Ge capacitor

Li, Quan-Li, Xie, Qi, Jiang, Yu-Long, Ru, Guo-Ping, Qu, Xin-Ping, Li, Bing-Zong, Zhang, David W, Deduytsche, Davy, Detavernier, Christophe

Journal:

Semiconductor Science and Technology

Year:

2011

Language:

english

File:

PDF, 874 KB

english, 2011

47

Defect Characterization of the Structure-Growth Zone-Model for Sputter Deposited Cu Films

De Baerdemaeker, Jérémie, Dauwe, Charles, Segers, Danny, Detavernier, C., Deduytsche, D., Egger, W., Sperr, Peter

Journal:

Materials Science Forum

Year:

2004

Language:

english

File:

PDF, 363 KB

english, 2004

48

Effective Schottky Barrier Height Modulation by an Ultrathin Passivation Layer of GeOxNy for Al∕n-Ge(100) Contact

Jiang, Yu-Long, Xie, Qi, Qu, Xin-Ping, Ru, Guo-Ping, Zhang, David W., Deduytsche, Davy, Detavernier, Christophe

Journal:

Electrochemical and Solid-State Letters

Year:

2011

Language:

english

File:

PDF, 166 KB

english, 2011

49

TaN∕Ta as an Effective Diffusion Barrier for Direct Contact of Copper and NiSi

Jiang, Yu-Long, Xie, Qi, Qu, Xin-Ping, Zhang, David W, Deduytsche, Davy, Detavernier, Christophe

Journal:

Electrochemical and Solid-State Letters

Year:

2012

Language:

english

File:

PDF, 297 KB

english, 2012

50

Improved Thermal Stability and Electrical Performance by Using PEALD Ultrathin Al2O3 Film with Ta as Cu Diffusion Barrier on Low k Dielectrics

Ding, S.-F., Xie, Q., Chen, F., Lu, H.-S., Deng, S.-R., Deduytsche, D., Detavernier, C., Qu, X.-P.

Journal:

ECS Solid State Letters

Year:

2012

Language:

english

File:

PDF, 538 KB

english, 2012

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