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101

Robust giant magnetoresistance material system for magnetic sensors

Lenssen, K.-M. H., Kuiper, A. E. T., Roozeboom, F.

Journal:

Journal of Applied Physics

Year:

1999

Language:

english

File:

PDF, 312 KB

english, 1999

102

[IEEE IEEE International Electron Devices Meeting 2003 - Washington, DC, USA (8-10 Dec. 2003)] IEEE International Electron Devices Meeting 2003 - Dopant redistribution effects in preamorphized silicon during low temperature annealing

Venezia, V.C., Duffy, R., Pelaz, L., Aboy, M., Heringa, A., Griffin, P.B., Wang, C.C., Hopstaken, M.J.P., Tamminga, Y., Dao, T., Pawlak, B., Roozeboom, F.

Year:

2003

Language:

english

File:

PDF, 244 KB

english, 2003

103

[IEEE 2012 4th Electronic System-Integration Technology Conference (ESTC) - Amsterdam, Netherlands (2012.09.17-2012.09.20)] 2012 4th Electronic System-Integration Technology Conference - Concept of Spatially-divided Deep Reactive Ion Etching of Si using oxide atomic layer deposition in the passivation cycle

Roozeboom, F., Kniknie, B., Knaapen, R., Smets, M., Illiberi, A., Poodt, P., Dingemans, G., Keuning, W., Kessels, W. M. M.

Year:

2012

Language:

english

File:

PDF, 2.60 MB

english, 2012

104

Room Temperature Sensing of O2 and CO by Atomic Layer Deposition Prepared ZnO Films Coated with Pt Nanoparticles

Erkens, I., Blauw, M., Verheijen, M., Roozeboom, F., Kessels, W. M. M.

Journal:

ECS Transactions

Year:

2013

Language:

english

File:

PDF, 468 KB

english, 2013

105

[IEEE 2007 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems - Long Beach, CA, USA (2007.01.10-2007.01.12)] 2007 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems - Silicon Based System-in-Package : a new technology platform supported by very high quality passives and system level design tools

Murray, F., LeCornec, F., Bardy, S., Bunel, C., Verhoeven, Jan, Den Heuvel, F.c.m., Klootwijk, J.H., Roozeboom, F.

Year:

2007

Language:

english

File:

PDF, 4.95 MB

english, 2007

106

[IEEE 2006 International Conference on Advanced Semiconductor Devices and Microsystems - Smolenice, Slovakia (2006.10.16-2006.10.18)] 2006 International Conference on Advanced Semiconductor Devices and Microsystems - Leakage characteristics of advanced MOS capacitors with hafnium silicate dielectric and Ru electrode

Tapajna, M., Husekova, K., Frohlich, K., Dobrocka, E., Roozeboom, F.

Year:

2006

Language:

english

File:

PDF, 3.79 MB

english, 2006

107

High-Rate Anisotropic Silicon Etching with the Expanding Thermal Plasma Technique

Blauw, M. A., van Lankvelt, P. J. W., Roozeboom, F., van de Sanden, M. C. M., Kessels, W. M. M.

Journal:

Electrochemical and Solid-State Letters

Year:

2007

Language:

english

File:

PDF, 302 KB

english, 2007

108

[IEEE 2011 37th IEEE Photovoltaic Specialists Conference (PVSC) - Seattle, WA, USA (2011.06.19-2011.06.24)] 2011 37th IEEE Photovoltaic Specialists Conference - Spatially-separated atomic layer deposition of Al2O3, a new option for high-throughput si solar cell passivation

Vermang, B., Werner, F., Stals, W., Lorenz, A., Rothschild, A., John, J., Poortmans, J., Mertens, R., Gortzen, R., Poodt, P., Roozeboom, F., Schmidt, J.

Year:

2011

Language:

english

File:

PDF, 570 KB

english, 2011

109

[IEEE The Fifth International Conference on Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. - Smolenice Castle, Slovakia (Oct. 17-21, 2004)] The Fifth International Conference on Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. - Thermal stability of ruthenium MOS gate electrodes

Tapajna, M., Cico, K., Luptak, R., Husekova, K., Frohlich, K., Harmmatha, L., Hooker, J.C., Roozeboom, F.

Year:

2004

Language:

english

File:

PDF, 1.05 MB

english, 2004

110

Tin Nitride Thin Films as Negative Electrode Material for Lithium-Ion Solid-State Batteries

Baggetto, Loïc, Verhaegh, Nynke A. M., Niessen, Rogier A. H., Roozeboom, Fred, Jumas, Jean-Claude, Notten, Peter H. L.

Journal:

Journal of The Electrochemical Society

Year:

2010

Language:

english

File:

PDF, 1.05 MB

english, 2010

111

[IEEE IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Munich, Germany (31 March-1 April 2003)] Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI - Electrical properties of MOCVD HfO/sub 2/ dielectric layers with polysilicon gate electrodes for CMOS applications

Date, L., Rittersma, Z.M., Massoubre, D., Ponomarev, Y., Roozeboom, F., Pique, D., van-Autryve, L., Van Elshocht, S., Caymax, M.

Year:

2003

Language:

english

File:

PDF, 352 KB

english, 2003

112

Ultrafast Atomic Layer Deposition of Alumina Layers for Solar Cell Passivation

Poodt, P., Tiba, V., Werner, F., Schmidt, J., Vermeer, A., Roozeboom, F.

Journal:

Journal of The Electrochemical Society

Year:

2011

Language:

english

File:

PDF, 906 KB

english, 2011

113

Impurity redistribution due to recrystallization of preamorphized silicon

Duffy, R., Venezia, V. C., van der Tak, K., Hopstaken, M. J. P., Maas, G. C. J., Roozeboom, F., Tamminga, Y., Dao, T.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2005

Language:

english

File:

PDF, 735 KB

english, 2005

114

Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices

Aslam, N., Longo, V., Rodenbücher, C., Roozeboom, F., Kessels, W. M. M., Szot, K., Waser, R., Hoffmann-Eifert, S.

Journal:

Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 2.63 MB

english, 2014

115

Atomic-scale engineering of multifunctional nano-sized materials and films

Roozeboom, Fred, Barreca, Davide, Devi, Anjana, Parala, Harish, Ritala, Mikko

Journal:

physica status solidi (a)

Year:

2014

Language:

english

File:

PDF, 92 KB

english, 2014

116

On the kinetics of spatial atomic layer deposition

Poodt, Paul, van Lieshout, Joep, Illiberi, Andrea, Knaapen, Raymond, Roozeboom, Fred, van Asten, Almie

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2013

Language:

english

File:

PDF, 1.14 MB

english, 2013

117

Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry

S. B. S. Heil, E. Langereis, A. Kemmeren, F. Roozeboom, M. C. M. Van De Sanden, W. M. M. Kessels

Year:

2005

Language:

english

File:

PDF, 397 KB

english, 2005

118

Energetics of Self-Interstitial Clusters in Si

Cowern, N. E. B., Mannino, G., Stolk, P. A., Roozeboom, F., Huizing, H. G. A., van Berkum, J. G. M., Cristiano, F., Claverie, A., Jaraíz, M.

Journal:

Physical Review Letters

Year:

1999

Language:

english

File:

PDF, 157 KB

english, 1999

119

[IEEE 2005 International Conference On Simulation of Semiconductor Processes and Devices - Tokyo, Japan (2005.09.3-2005.09.3)] 2005 International Conference On Simulation of Semiconductor Processes and Devices - Modeling Dopant Diffusion in Strained and Strain-Relaxed Epi-SiGe

Yi-Ming Sheu,, Tsung-Yi Huang,, Yu-Ping. Hu,, Chih-Chiang Wang,, Liu, S., Duffy, R., Heringa, A., Roozeboom, F., Cowern, N.E.B., Griffin, P.B.

Year:

2005

Language:

english

File:

PDF, 467 KB

english, 2005

120

On the environmental stability of ZnO thin films by spatial atomic layer deposition

Illiberi, Andrea, Scherpenborg, Robert, Theelen, Mirjam, Poodt, Paul, Roozeboom, Fred

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2013

Language:

english

File:

PDF, 1.24 MB

english, 2013

121

Plasma-Assisted Atomic Layer Deposition of PtO x from (MeCp)PtMe 3 and O 2 Plasma

Erkens, Ivo J. M., Verheijen, Marcel A., Knoops, Harm C. M., Landaluce, Tatiana F., Roozeboom, Fred, Kessels, Wilhelmus M. M.

Journal:

Chemical Vapor Deposition

Year:

2014

Language:

english

File:

PDF, 1.03 MB

english, 2014

122

[IEEE 2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII) - Barcelona, Spain (2013.06.16-2013.06.20)] 2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII) - Integrated sensor cross-sensitivity analysis

Roozeboom, C. L., Salgado, J. F., Hopcroft, M. A., Pruitt, B. L.

Year:

2013

Language:

english

File:

PDF, 864 KB

english, 2013

123

Recent Advances in Atmospheric Vapor-Phase Deposition of Transparent and Conductive Zinc Oxide

Illiberi, Andrea, Poodt, Paul, Bolt, Pieter-Jan, Roozeboom, Fred

Journal:

Chemical Vapor Deposition

Year:

2014

Language:

english

File:

PDF, 1.27 MB

english, 2014

124

Deposition of TiN and HfO[sub 2] in a commercial 200 mm remote plasma atomic layer deposition reactor

S. B. S. Heil, J. L. Van Hemmen, C. J. Hodson, N. Singh, J. H. Klootwijk, F. Roozeboom, M. C. M. Van De Sanden, W. M. M. Kessels

Year:

2007

Language:

english

File:

PDF, 998 KB

english, 2007

125

Sur l'hydrate de l'acide sulfureux

H. W. B. Roozeboom

Year:

1884

Language:

french

File:

PDF, 1.18 MB

french, 1884

126

Enhanced electrical properties of atomic layer deposited La[sub 2]O[sub 3] thin films with embedded ZrO[sub 2] nanocrystals

Jinesh, K. B., Klootwijk, J. H., Lamy, Y., Wolters, R., Tois, E., Tuominen, M., Roozeboom, F., Besling, W. F. A.

Journal:

Applied Physics Letters

Year:

2008

Language:

english

File:

PDF, 325 KB

english, 2008

127

Very low surface recombination velocities on p- and n-type c-Si by ultrafast spatial atomic layer deposition of aluminum oxide

F. Werner, B. Veith, V. Tiba, P. Poodt, F. Roozeboom, R. Brendel, J. Schmidt

Year:

2010

Language:

english

File:

PDF, 774 KB

english, 2010

128

Boride-enhanced diffusion in silicon: Bulk and surface layers

Cowern, N. E. B., Theunissen, M. J. J., Roozeboom, F., van Berkum, J. G. M.

Journal:

Applied Physics Letters

Year:

1999

Language:

english

File:

PDF, 257 KB

english, 1999

129

Plasma-assisted atomic layer deposition of TiN/Al[sub 2]O[sub 3] stacks for metal-oxide-semiconductor capacitor applications

Hoogeland, D., Jinesh, K. B., Roozeboom, F., Besling, W. F. A., van de Sanden, M. C. M., Kessels, W. M. M.

Journal:

Journal of Applied Physics

Year:

2009

Language:

english

File:

PDF, 763 KB

english, 2009

130

in thin Fe films observed by means of nuclear resonant scattering of synchrotron radiation

Niesen, L., Mugarza, A., Rosu, M. F., Coehoorn, R., Jungblut, R. M., Roozeboom, F., Baron, A. Q. R., Chumakov, A. I., Rüffer, R.

Journal:

Physical Review B

Year:

1998

Language:

english

File:

PDF, 115 KB

english, 1998

131

Silicon out-diffusion and aluminum in-diffusion in devices with atomic-layer deposited La[sub 2]O[sub 3] thin films

Jinesh, K. B., Lamy, Y., Wolters, R. A. M., Klootwijk, J. H., Tois, E., Roozeboom, F., Besling, W. F. A.

Journal:

Applied Physics Letters

Year:

2008

Language:

english

File:

PDF, 408 KB

english, 2008

132

Exchange-biased spin valves combining a high magnetoresistance ratio with soft-magnetic behavior

Kools, J. C. S., Lardoux, S., Roozeboom, F.

Journal:

Applied Physics Letters

Year:

1998

Language:

english

File:

PDF, 238 KB

english, 1998

133

Groups III and V impurity solubilities in silicon due to laser, flash, and solid-phase-epitaxial-regrowth anneals

Duffy, R., Dao, T., Tamminga, Y., van der Tak, K., Roozeboom, F., Augendre, E.

Journal:

Applied Physics Letters

Year:

2006

Language:

english

File:

PDF, 420 KB

english, 2006

134

[IEEE 7th Joint MMM-Intermag Conference. Abstracts - San Francisco, CA, USA (6-9 Jan. 1998)] 7th Joint MMM-Intermag Conference. Abstracts (Cat. No.98CH36275) - Thermally Assisted Reversal of Exchange Biasing in Nio and Femn Based Systems

Van Der Heijden, P.A.A., Maas, T.F.M.M.W., De Jonge, W.J.M., Kools, J.C.S., Roozeboom, F., van der Zaag, P.J.

Year:

1998

Language:

english

File:

PDF, 138 KB

english, 1998

135

Synthesis and in situ characterization of low-resistivity TaN[sub x] films by remote plasma atomic layer deposition

Langereis, E., Knoops, H. C. M., Mackus, A. J. M., Roozeboom, F., van de Sanden, M. C. M., Kessels, W. M. M.

Journal:

Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 1.08 MB

english, 2007

136

Si interstitial contribution of F[sup +] implants in crystalline Si

López, Pedro, Pelaz, Lourdes, Duffy, R., Meunier-Beillard, P., Roozeboom, F., van der Tak, K., Breimer, P., van Berkum, J. G. M., Verheijen, M. A., Kaiser, M.

Journal:

Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 603 KB

english, 2008

137

Plasma-assisted atomic layer deposition of Ta[sub 2]O[sub 5] from alkylamide precursor and remote O[sub 2] plasma

Heil, S. B. S., Roozeboom, F., van de Sanden, M. C. M., Kessels, W. M. M.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2008

Language:

english

File:

PDF, 787 KB

english, 2008

138

[IEEE International Electron Devices Meeting 1998. Technical Digest - San Francisco, CA, USA (6-9 Dec. 1998)] International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217) - Ultra-shallow junction formation by outdiffusion from implanted oxide

Schmitz, J., van Gestel, M., Stolk, P.A., Ponomarev, Y.V., Roozeboom, F., van Berkum, J.G.M., Zalm, P.C., Woerlee, P.H.

Year:

1998

Language:

english

File:

PDF, 344 KB

english, 1998

139

Sur la dissociation des hydrates de l'acide sulfureux, du chlore et du brome

Roozeboom, H. W. Bakhuis

Journal:

Recueil des Travaux Chimiques des Pays-Bas

Year:

2010

Language:

french

File:

PDF, 317 KB

french, 2010

140

[IEEE 2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) - Austin, TX, USA (2012.06.3-2012.06.8)] 2012 38th IEEE Photovoltaic Specialists Conference - Atmospheric pressure deposition of SnO2 and ZnO

van Deelen, Joop, Kniknie, Bas, Grob, Frank, Volintiru, Ioanna, Roozeboom, Fred, Poodt, Paul, Illiberi, Andrea

Year:

2012

Language:

english

File:

PDF, 593 KB

english, 2012

141

Sur l'hydrate de chlore

Roozeboom, H. W. Bakhuis

Journal:

Recueil des Travaux Chimiques des Pays-Bas

Year:

2010

Language:

french

File:

PDF, 556 KB

french, 2010

142

Low Interface Recombination Velocity in GaAs-(Al, Ga)As Double Heterostructures Grown by Metal Organic Vapour Phase Epitaxy

Hooft, G. W.'t, Leys, M. R., Roozeboom, F.

Journal:

Japanese Journal of Applied Physics

Year:

1985

File:

PDF, 409 KB

1985

143

Atmospheric pressure plasma enhanced spatial ALD of silver

van den Bruele, Fieke J., Smets, Mireille, Illiberi, Andrea, Creyghton, Yves, Buskens, Pascal, Roozeboom, Fred, Poodt, Paul

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2015

Language:

english

File:

PDF, 1.56 MB

english, 2015

144

Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al[sub 2]O[sub 3] Thin Films

Jinesh, K. B., van Hemmen, J. L., van de Sanden, M. C. M., Roozeboom, F., Klootwijk, J. H., Besling, W. F. A., Kessels, W. M. M.

Journal:

Journal of The Electrochemical Society

Year:

2011

Language:

english

File:

PDF, 350 KB

english, 2011

145

ALD of SrTiO3 and Pt for Pt/SrTiO3/Pt MIM Structures: Growth and Crystallization Study

Longo, V., Roozeboom, F., Kessels, W. M. M., Verheijen, M.

Journal:

ECS Transactions

Year:

2013

Language:

english

File:

PDF, 1.01 MB

english, 2013

146

Spatial Atmospheric Atomic Layer Deposition of In x Ga y Zn z O for Thin Film Transistors

Illiberi, A., Cobb, B., Sharma, A., Grehl, T., Brongersma, H., Roozeboom, F., Gelinck, G., Poodt, P.

Journal:

ACS Applied Materials & Interfaces

Year:

2015

Language:

english

File:

PDF, 1.38 MB

english, 2015

147

[ECS 216th ECS Meeting - Vienna, Austria (October 4 - October 9, 2009)] ECS Transactions - Plasma-Assisted ALD of TiN/Al

Hoogeland, Dirk-Jan, Jinesh, K.B., Roozeboom, F., Besling, W. F. A., Lamy, Y., Roozeboom, F., Van de Sanden, M. C., Kessels, W. M.

Year:

2009

Language:

english

File:

PDF, 2.20 MB

english, 2009

148

Dielectric Material Options for Integrated Capacitors

Ruhl, G., Lehnert, W., Lukosius, M., Wenger, C., Baristiran Kaynak, C., Blomberg, T., Haukka, S., Baumann, P. K., Besling, W., Roest, A., Riou, B., Lhostis, S., Halimaou, A., Roozeboom, F., Langereis,

Journal:

ECS Journal of Solid State Science and Technology

Year:

2014

Language:

english

File:

PDF, 1.09 MB

english, 2014

149

Mass Spectrometry Study of the Temperature Dependence of Pt Film Growth by Atomic Layer Deposition

Erkens, I. J. M., Mackus, A. J. M., Knoops, H. C. M., Smits, P., van de Ven, T. H. M., Roozeboom, F., Kessels, W. M. M.

Journal:

ECS Journal of Solid State Science and Technology

Year:

2012

Language:

english

File:

PDF, 392 KB

english, 2012

150

A New Concept for Spatially-Divided Reactive Ion Etching with ALD-Based Passivation

Roozeboom, F., Kniknie, B., Lankhorst, A. M., Winands, G., Knaapen, R., Smets, M., Poodt, P., Dingemans, G., Keuning, W., Kessels, W. M. M.

Journal:

ECS Transactions

Year:

2013

Language:

english

File:

PDF, 1.59 MB

english, 2013