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1

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Shallow p-type source/drain extension formation using B2H6 plasma doping for deep submicron CMOS

Hu, Jerry C., Kraft, Robert, Rodder, Mark, Chen, Ih-Chin, Burnett, David, Wristers, Dirk, Tsuchiya, Toshiaki

Year:

1998

Language:

english

File:

PDF, 403 KB

english, 1998

2

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Optimization of pre-gate clean technology for a 0.35-μm dual-oxide/dual-voltage CMOS process

Brugge, Hunter B., Karnett, Martin P., de Muizon, Emmanuel, Zhou, Jingrong, Page, Allen, Vines, Landon B., Haby, Bradley J., Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 270 KB

english, 1997

3

[IEEE ESSDERC 2003. 33rd European Solid-State Device Research - ESSDERC '03 - Estoril, Portugal (16-18 Sept. 2003)] Electrical Performance of Electrical Packaging (IEEE Cat. No. 03TH8710) - 45nm gate length Bulk/PD-SOI CMOS transistors with low gate leakage current for high speed and low power applications

Yang, C.K., Chen, T.F., Liang, C.S., Chen, T.J., Chang, T.C., Cheng, L.W., Lin, H.S., Li, G., Wu, D.Y., Chen, J.K., Chien, S.C., Sun, S.W., Cheek, J., Michael, M., Wu, D., Fisher, P., Wristers, D.

Year:

2003

Language:

english

File:

PDF, 224 KB

english, 2003

4

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Impact of photoresist taper and implant tilt angle on the interwell isolation of subquarter-micron CMOS technologies

Gilbert, Percy V., Grant, John, Tsui, Paul, King, Charles F., Taylor, William J., Wimmer, Karl, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 547 KB

english, 1997

5

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Tuned MEDICI simulator including inverse short channel effect for sub-0.18-μm CMOS technologies

Nandakumar, Mahalingam, Sridhar, S., Vasanth, Karthik, Hu, Jerry C., Shiau, Wei-Tsun, Mei, P., Rodder, Mark, Chen, Ih-Chin, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 477 KB

english, 1997

6

Electrical properties and reliability of MOSFET's with rapid thermal NO-nitrided SiO/sub 2/ gate dielectrics

Bhat, M., Wristers, D.J., Liang-Kai Han,, Jiang Yan,, Fulford, H.J., Dim-Lee Kwong,

Journal:

IEEE Transactions on Electron Devices

Year:

1995

Language:

english

File:

PDF, 847 KB

english, 1995

7

[IEEE 2000 IEEE International Integrated Reliability Workshop Final Report - Lake Tahoe, CA, USA (23-26 Oct. 2000)] 2000 IEEE International Integrated Reliability Workshop Final Report (Cat. No.00TH8515) - Plasma-induced-damage (PID) free 29A nitrided gate oxide of 130 nm CMOS devices for high performance microprocessor manufacturing

Klein, G., Nariman, H., Wu, D., Tao, J., Bandyopadhyay, B., Wristers, D., Ibok, E., McBride, M., Tsiang, J., Ju, D.H., Fang, P.

Year:

2000

Language:

english

File:

PDF, 349 KB

english, 2000

8

Mechanism of metal-catalyzed rearrangement of strained cyclobutane and cyclobutene derivatives

Pettit, Rowland., Wristers, J., Brener, Lazaro.

Journal:

Journal of the American Chemical Society

Year:

1970

Language:

english

File:

PDF, 401 KB

english, 1970

9

[IEEE Proceedings of International Reliability Physics Symposium - Dallas, TX, USA (1996.04.30-1996.05.2)] Proceedings of International Reliability Physics Symposium RELPHY-96 - Ultra thin oxide reliability: effects of gate doping concentration and poly-Si/SiO/sub 2/ interface stress relaxation

Wristers, D., Wang, H.H., Wolf, I.D., Han, L.K., Kwong, D.L., Fulford, J.

Year:

1996

Language:

english

File:

PDF, 754 KB

english, 1996

10

Impact of upper endoscopy on satisfaction in patients with previously uninvestigated dyspepsia

Linda Rabeneck, Kimberly Wristers, Julianne Souchek, Eunice Ambriz

Journal:

Gastrointestinal Endoscopy

Year:

2003

Language:

english

File:

PDF, 78 KB

english, 2003

11

[IEEE 1994 IEEE International Electron Devices Meeting - San Francisco, CA, USA (11-14 Dec. 1994)] Proceedings of 1994 IEEE International Electron Devices Meeting - Polarity dependence of dielectric breakdown in scaled SiO/sub 2/

Han, L.K., Bhat, M., Wristers, D., Fulford, J., Kwong, D.L.

Year:

1994

Language:

english

File:

PDF, 373 KB

english, 1994

12

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Strained Si NMOSFET on relaxed Si1-xGex formed by ion implantation of Ge

John, Soji, Ray, Samit K., Oswal, Sandeep K., Banerjee, Sanjay K., Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 170 KB

english, 1997

13

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Thin-film integration for nanoscale and high-frequency electronics on Si

Laskar, Joy, Jokerst, Nan Marie, Evers, N., Chun, C., Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 276 KB

english, 1997

14

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Improved analytic models and efficient parameter extraction for computationally efficient 1D and 2D ion implantation modeling

Balamurugan, Ganesh, Obradovic, Borna J., Wang, Geng, Chen, Yidong, Tasch, Al F., Burnett, David, Wristers, Dirk, Tsuchiya, Toshiaki

Year:

1998

Language:

english

File:

PDF, 582 KB

english, 1998

15

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Statistical analysis of dynamic-random-access-memory data-retention characteristics

Hiraiwa, Atsushi, Rodder, Mark, Tsuchiya, Toshiaki, Ogasawara, Makoto, Natsuaki, Nobuyoshi, Burnett, David, Wristers, Dirk, Itoh, Yutaka, Iwai, Hidetoshi

Year:

1997

Language:

english

File:

PDF, 275 KB

english, 1997

16

Effects of chemical composition on the electrical properties of NO-nitrided SiO2

Bhat, M., Han, L. K., Wristers, D., Yan, J., Kwong, D. L., Fulford, J.

Journal:

Applied Physics Letters

Year:

1995

Language:

english

File:

PDF, 259 KB

english, 1995

17

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Prediction of CMOS transistor performance at 0.10-μm gate length using tuned simulations

Sridhar, S., Mehrotra, Manoj, Rodder, Mark, Nandakumar, Mahalingam, Chen, Ih-Chin, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 270 KB

english, 1997

18

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Effect of local interconnect etch-stop layer on channel hot-electron degradation

Cheek, Jon, Nariman, Homi E., Wristers, Dirk, Nayak, Deepak, Hao, Ming-Yin, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 160 KB

english, 1997

19

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Microprocessor technology challenges through the next decade

Sery, George E., Burnett, David, Wristers, Dirk, Tsuchiya, Toshiaki

Year:

1998

Language:

english

File:

PDF, 478 KB

english, 1998

20

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Feasibility study to determine the suitability of using TiN/W and Si1-xGex as alternative gate materials for sub-0.1-μm gate-length PMOS devices

Murtaza, Suhail S., Hu, Jerry C., Unnikrishnan, Sreenath, Rodder, Mark, Chen, Ih-Chin, Burnett, David, Wristers, Dirk, Tsuchiya, Toshiaki

Year:

1998

Language:

english

File:

PDF, 256 KB

english, 1998

21

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Sheet resistance requirements for the source/drain regions of 0.11-μm gate length CMOS technology

Rodder, Mark, Mehrotra, Manoj, Chatterjee, Amitava, Tsuchiya, Toshiaki, Burnett, David, Chen, Ih-Chin, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 203 KB

english, 1997

22

Recent developments in Ultra thin oxynitride gate dielectrics

L.K. Han, M. Bhat, D. Wristers, H.H. Wang, D.L. Kwong

Journal:

Microelectronic Engineering

Year:

1995

Language:

english

File:

PDF, 608 KB

english, 1995

23

The Thermal Rearrangement of 1,5-Hexadiyne and Related Compounds

Huntsman, William D., Wristers, Harry J.

Journal:

Journal of the American Chemical Society

Year:

1967

Language:

english

File:

PDF, 812 KB

english, 1967

24

SODA on the web: A novel method for collecting internation on patient outcomes in dyspepsia

Rabeneck, Linda, Wristers, Kimberly, Ambriz, Eunice

Journal:

Gastroenterology

Year:

2001

Language:

english

File:

PDF, 183 KB

english, 2001

25

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Wafer-scale modeling of pattern effect in oxide chemical mechanical polishing

Ouma, Dennis O., Stine, Brian, Divecha, Rajesh, Boning, Duane S., Chung, James E., Shinn, Gregory B., Ali, Iqbal, Clark, John, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 492 KB

english, 1997

26

SPIE Proceedings [SPIE Microelectronic Manufacturing '95 - Austin, TX, United States (Wednesday 25 October 1995)] Microelectronic Manufacturing Yield, Reliability, and Failure Analysis - Material processing and advanced well structures using high-energy implantation for EPI replacement

Wristers, Dirk, Eiting, Chris, Morris, Wes, Kwong, Dim-Lee, Fulford, Jim

Year:

1995

Language:

english

File:

PDF, 414 KB

english, 1995

27

High Quality Ultrathin Gate Dielectrics Prepared by In-Situ RTP

Han, L. K., Bhat, M., Yan, J., Wristers, D., Kwong, D. L.

Journal:

MRS Proceedings

Year:

1995

Language:

english

File:

PDF, 638 KB

english, 1995

28

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Self-aligned silicide process technology for sub-0.25-μm geometries

White, Ted R., Kolar, Dave, Jahanbani, Mohamed, Frisa, Larry E., Nagabushnam, Rajan, Chuang, Harry, Tsui, Paul, Cope, Jeff, Pulvirent, Larry, Bolton, Scott, Burnett, David, Wristers, Dirk, Tsuchiya, T

Year:

1998

Language:

english

File:

PDF, 1.31 MB

english, 1998

29

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Novel thin epi process for high-speed CB-CMOS

Drobny, Vladimir F., Bao, Kevin X., Burnett, David, Wristers, Dirk, Tsuchiya, Toshiaki

Year:

1998

Language:

english

File:

PDF, 653 KB

english, 1998

30

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Si 1-x-y Ge x C y channel heterojunction PMOSFETs

John, Soji, Rodder, Mark, Tsuchiya, Toshiaki, Ray, Samit K., Oswal, Sandeep K., Burnett, David, Wristers, Dirk, Banerjee, Sanjay K.

Year:

1997

Language:

english

File:

PDF, 216 KB

english, 1997

31

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Ultrathin film fully depleted CMOS/SIMOX technology with selective CVD tungsten and its application to LSIs

Sato, Yasuhiro, Burnett, David, Wristers, Dirk, Kosugi, Toshihiko, Ishii, Hiromu, Tsuchiya, Toshiaki

Year:

1998

Language:

english

File:

PDF, 1.25 MB

english, 1998

32

Strong acid-catalyzed hydrogenation of aromatics

Journal:

Journal of the American Chemical Society

Year:

1975

Language:

english

File:

PDF, 627 KB

english, 1975

33

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Production of ohmic contacts to AlxGa1-xAs of the n- and p-type conductivity with surface cleaning in atomic hydrogen

Vishnyakov, A. S., Kagadei, Valerii A., Kozhinova, N. I., Romas, L. M., Proskurovsky, Dmitry I., Burnett, David, Wristers, Dirk, Tsuchiya, Toshiaki

Year:

1998

Language:

english

File:

PDF, 1.21 MB

english, 1998

34

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Improvement of edge leakage in PBL-isolated SOI NMOSFETs

Burnett, David, Lien, Mitch, Baker, Kelly, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 282 KB

english, 1997

35

ChemInform Abstract: AUSDEHNUNG DER WOODWARD-HOFFMAN-REGEL AUF ORGANOMETALL-SYST.

PETTIT, R., SUGAHARA, H., WRISTERS, J., MERK, W.

Journal:

Chemischer Informationsdienst. Organische Chemie

Year:

1970

Language:

german

File:

PDF, 239 KB

german, 1970

36

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Optimized shallow trench isolation for sub-0.18-μm ASIC technologies

Nouri, Faran, Laparra, Olivier, Sur, Harlan, Saha, Samar K., Pramanik, Dipankar, Manley, Martin, Burnett, David, Wristers, Dirk, Tsuchiya, Toshiaki

Year:

1998

Language:

english

File:

PDF, 2.32 MB

english, 1998

37

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - 0.18-μm gate length CMOS devices with N+ polycide gate for 2.5-V application

Choi, Jeong Y., Zhang, Eric, Han, Chung C., Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 160 KB

english, 1997

38

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Computationally efficient ion implantation damage model: modified Kinchin-Pease model

Wang, Geng, Tian, Shiyang, Morris, Michael F., Morris, Steven J., Obradovic, Borna J., Balamurugan, Ganesh, Tasch, Jr., Al F., Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 415 KB

english, 1997

39

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - High-k scaling for gate insulators: an insightful study

Krishnan, Srinath, Yeap, Geoffrey C., Yu, Bin, Xiang, Qi, Lin, Ming-Ren, Burnett, David, Wristers, Dirk, Tsuchiya, Toshiaki

Year:

1998

Language:

english

File:

PDF, 385 KB

english, 1998

40

[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - Epi avoidance for CMOS logic devices using MeV implantation

Borland, J.O., Wristers, D., Walker, J.

Year:

1997

Language:

english

File:

PDF, 333 KB

english, 1997

41

Sociodemographics, General Health, and Psychologic Health in Uninvestigated Dyspepsia

Rabeneck, Linda, Wristers, Kimberly, Campbell, Catherine, Souchek, Julianne, Menke, Terri, Wray, Nelda P.

Journal:

Journal of Clinical Gastroenterology

Year:

2002

Language:

english

File:

PDF, 478 KB

english, 2002

42

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Design of 0.18-micron NMOSFETs for low-power applications

Khan, Shamsul A., Hareland, Scott A., Tasch, Jr., Al F., Maziar, Christine M., Zeitzoff, Peter, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 352 KB

english, 1997

43

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Narrow-channel transistor threshold self-adjustment technique for ULSI with LOCOS isolation

Loiko, Konstantin V., Peidous, Igor V., Ho, Hok-Min, Bromley-Barratt, John F., Quek, Elgin T., Lim, David H. Y., Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 85 KB

english, 1997

44

Correction of joint angle-time diagrams to standardize equine kinematic data

Willem Back, Henk C. Schamhardt, Albert Barneveld, Wrister Hartman

Journal:

Journal of Biomechanics

Year:

1994

Language:

english

File:

PDF, 120 KB

english, 1994

45

[IEEE 2012 IEEE Technology Time Machine (TTM) - Dresden, Germany (2012.05.23-2012.05.25)] 2012 IEEE Technology Time Machine Symposium (TTM) - The future in manufacturing

Year:

2012

Language:

english

File:

PDF, 64 KB

english, 2012

46

Enhanced Degradation in P+-Poly PMOSFETs With Oxynitride Gate Dielectrics Under Hot-Hole Injection

Chen, Y. Y., Gardner, M., Fulford, J., Wristers, D., Joshi, A. B., Kwong, D. L.

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 328 KB

english, 1999

47

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Potential of rf Si-MOS LSI technology

Matsuzawa, Akira, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 378 KB

english, 1997

48

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Silicon bipolar transistor scaling for advanced BiCMOS SRAM applications

Tian, H., Perera, Asanga H., O'Meara, D., De, H., Subramanian, C. K., Rehmann, P., Hayden, James D., Herr, Norm, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 1.11 MB

english, 1997

49

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Methods for the design of microelectronic devices and process flows for manufacturability

Saxena, Sharad, Burch, Richard, Mozumder, P. K., Vasanth, Karthik, Rao, Suraj, Davis, Joe, Fernando, Chenjing, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 146 KB

english, 1997

50

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Constant current-stress-induced breakdown of reoxidized nitrided oxide (ONO) in flash memory devices

Cha, Cher L., Chor, Eng F., Gong, H., Zhang, Alex Q., Chan, Lap H., Xie, Joseph, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 474 KB

english, 1997

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