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51

Observation of Reduced Oxidation Rates for Plasmaassisted CVD Copper Films

Ding, P. J., Zheng, B., Eisenbraun, E. T., Lanford, W. A., Kaloyeros, A. E., Hymes, S., Murarka, S. P.

Journal:

MRS Proceedings

Year:

1993

Language:

english

File:

PDF, 263 KB

english, 1993

52

MOCVD ZnS:Mn Films: Grain Size Distribution and Crystal Structure as a Function of the Growth Parameters

Dunn, Kathleen A., Dovidenko, Katharine, Topol, Anna W., Oktyabrsky, Serge R., Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

2001

Language:

english

File:

PDF, 2.69 MB

english, 2001

53

Synthesis and characterization of volatile bismuth .beta.-diketonate compounds for metal-organic chemical vapor deposition of thin films

Brooks, K. C., Turnipseed, S. B., Barkley, R. M., Sievers, R. E., Tulchinsky, V., Kaloyeros, A. E.

Journal:

Chemistry of Materials

Year:

1992

Language:

english

File:

PDF, 631 KB

english, 1992

54

Efficient energy transfer from silicon oxycarbide matrix to Er ions via indirect excitation mechanisms

Gallis, Spyros, Huang, Mengbing, Kaloyeros, Alain E.

Journal:

Applied Physics Letters

Year:

2007

Language:

english

File:

PDF, 332 KB

english, 2007

55

CVD of Tantalum Oxide Dielectric Thin Films for Nanoscale Device Applications

Zeng, Wanxue, Eisenbraun, Eric, Frisch, Harry, Sullivan, John J., Kaloyeros, Alain E., Margalit, Jonathan, Beck, Karsten

Journal:

Journal of The Electrochemical Society

Year:

2004

Language:

english

File:

PDF, 249 KB

english, 2004

56

Low Temperature CVD Route to Binary and Ternary Diffusion Barrier Nitrides for Cu Metallization

Kaloyeros, Alain E., Kelsey, Jean, Goldberg, Cindy, Anjum, Dalaver, Chen, Xiaomeng, Mirza, Jawid, Kumar, Kaushik, Arkles, Barry, Han, Bin, Sullivan, John J.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 432 KB

english, 1998

57

Heteroepitaxial Si-ZrO2-Si by MOCVD

Greenwald, Anton C., Kalkhoran, Nader M., Namavar, Fereydoon, Kaloyeros, Alain E., Stathakos, Ioannis

Journal:

MRS Proceedings

Year:

1993

Language:

english

File:

PDF, 1.19 MB

english, 1993

58

Application of characteristic secondary ion mass spectroscopy to phase identification in amorphous titanium carbide

Alain Kaloyeros, Wendell S. Williams

Journal:

Surface Science

Year:

1986

Language:

english

File:

PDF, 247 KB

english, 1986

59

Device-quality copper using chemical vapor deposition of β-diketonate source precursors in liquid solution

B. Zheng, E. T. Eisenbraun, J. Liu, A. E. Kaloyeros

Year:

1992

Language:

english

File:

PDF, 655 KB

english, 1992

60

High-quality Y1Ba2Cu3O7−x thin films on polycrystalline MgO by temperature-controlled chemical vapor deposition

Feng, Aiguo, Chen, Ling, Piazza, Timothy W., Li, Hongwen, Kaloyeros, Alain E., Hazelton, Drew W., Luo, Li, Dye, Robert C.

Journal:

Applied Physics Letters

Year:

1991

Language:

english

File:

PDF, 704 KB

english, 1991

61

White light emission from amorphous silicon oxycarbide (a-SiC[sub x]O[sub y]) thin films: Role of composition and postdeposition annealing

Gallis, Spyros, Nikas, Vasileios, Suhag, Himani, Huang, Mengbing, Kaloyeros, Alain E.

Journal:

Applied Physics Letters

Year:

2010

Language:

english

File:

PDF, 820 KB

english, 2010

62

Low temperature metal-organic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization

J. E. Kelsey, C. Goldberg, G. Nuesca, G. Peterson, A. E. Kaloyeros, B. Arkles

Year:

1999

Language:

english

File:

PDF, 762 KB

english, 1999

63

Thermal coefficient of resistivity of ultrathin Ag films deposited on Cu for applications in emerging interconnect systems

Tatem, Elroy A., Kaloyeros, Alain E., Eisenbraun, Eric T.

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2014

Language:

english

File:

PDF, 728 KB

english, 2014

64

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Nanoengineering: Fabrication, Properties, Optics, and Devices IX - Study of the effects of structural properties on the photoluminescence behavior of erbium thin films

Kamineni, Himani S., Gallis, Spyros, Huang, Mengbing, Kaloyeros, Alain E., Dobisz, Elizabeth A., Eldada, Louay A.

Year:

2012

Language:

english

File:

PDF, 752 KB

english, 2012

65

Sputtered Fitas of Amorphous Hydrogenated Silicon Carbide

Rizk, Richard B., Kaloyeros, Alain E., Williams, Wendell S., Finnegan, Nancy, Kozlowski, Carol

Journal:

MRS Proceedings

Year:

1987

Language:

english

File:

PDF, 342 KB

english, 1987

66

Thermal Chemical Vapor Deposition of Silicon Carbide Films as Protective Coatings for Microfluidic Structures

Gallis, Spyros, Futschik, Ulrike, Castracane, James, Kaloyeros, Alain E., Efstathiadis, Harry, Sherwood, Walter, Hayes, Susan, Fountzoulas, Costas G.

Journal:

MRS Proceedings

Year:

2002

Language:

english

File:

PDF, 323 KB

english, 2002

67

MOCVD ZnS:Mn Films: Crystal Structure and Defect Microstructure as a Function of the Growth Parameters

Dunn, Kathleen A., Dovidenko, Katharine, Topol, Anna W., Shekhawat, Gajendra S., Geer, Robert E., Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

2001

Language:

english

File:

PDF, 2.82 MB

english, 2001

68

The Low-Temperature Metal-Organic Chemical Vapor Deposition (Ltmocvd) Route to Amorphous Silicon Semiconductors

Kaloyeros, Aain E., Corbett, James W., Tobcano, Paul J., Rizk, Richard B.

Journal:

MRS Proceedings

Year:

1990

Language:

english

File:

PDF, 344 KB

english, 1990

69

Interconnect limits on gigascale integration (GSI) in the 21st century

Davis, J.A., Venkatesan, R., Kaloyeros, A., Beylansky, M., Souri, S.J., Banerjee, K., Saraswat, K.C., Rahman, A., Reif, R., Meindl, J.D.

Journal:

Proceedings of the IEEE

Year:

2001

Language:

english

File:

PDF, 473 KB

english, 2001

70

Profile simulation of conformality of chemical vapor deposited copper in subquarter-micron trench and via structures

A. Burke, G. Braeckelmann, D. Manger, E. Eisenbraun, A. E. Kaloyeros, J. P. Mcvittie, J. Han, D. Bang, J. F. Loan, J. J. Sullivan

Year:

1997

Language:

english

File:

PDF, 2.48 MB

english, 1997

71

Hydridosilane Modification of Metals: An Exploratory Study

Matisons, Janis, Arkles, Barry, Kin, Yun Mi, Pon, You Lin, Eisenbraun, Eric, Kaloyeros, Alex

Journal:

Advanced Materials Research

Year:

2011

Language:

english

File:

PDF, 397 KB

english, 2011

72

In Situ Studies of the Nucleation Mechanisms of Tris(cyclopentadienyl)Cerium as Cerium Dopant Source in SrS:Ce Thin Films for Electroluminescent Displays

Lau, Janice E., Peterson, Gregory G., Endisch, Denis, Barth, Karl, Topol, Anna, Kaloyeros, Alain E., Tuenge, Richard T., King, Christopher N.

Journal:

Journal of The Electrochemical Society

Year:

2001

Language:

english

File:

PDF, 128 KB

english, 2001

73

Low temperature plasma-assisted chemical vapor deposition of tantalum nitride from tantalum pentabromide for copper metallization

X. Chen, H. L. Frisch, A. E. Kaloyeros, B. Arkles, J. Sullivan

Year:

1999

Language:

english

File:

PDF, 3.42 MB

english, 1999

74

Chemical Vapor Deposition Route to the Fabrication of thin Films of High Temperature Oxide Superconductors

Kaloyeros, Alain E., Brooks, Kenneth C., Feng, Aiguo, Garhart, Jonathan

Journal:

MRS Proceedings

Year:

1989

Language:

english

File:

PDF, 229 KB

english, 1989

75

Copper Metallization Manufacturing Issues for Future ICs

Gutmann, Ronald J., Paul Chow, T., Gill, William N., Kaloyeros, Alain E., Lanford, William A., Murarka, Shyam P.

Journal:

MRS Proceedings

Year:

1994

Language:

english

File:

PDF, 2.85 MB

english, 1994

76

Integration of PECVD Tungsten Nitride as a Barrier Layer for Copper Metallization

Ivanova, A. R., Galewski, C. J., Sans, C. A., Seidel, T. E., Grunow, S., Kumar, K., Kaloyeros, A. E.

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 1.17 MB

english, 1999

77

[IEEE IEEE 1998 International Interconnect Technology Conference - San Francisco, CA, USA (1-3 June 1998)] Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat. No.98EX102) - Integration study of benzocyclobutene with CVD-based aluminum metallization

Gundlach, H., Knorr, A., Nijsten, S., Kumar, K., Bian, Z., Talevi, R., Shaffer, E.O., Kaloyeros, A.E., Geer, R.E.

Year:

1998

Language:

english

File:

PDF, 482 KB

english, 1998

78

Electrical Properties of Ultrathin Al2O3 Films Grown by Metalorganic Chemical Vapor Deposition for Advanced Complementary Metal-oxide Semiconductor Gate Dielectric Applications

Skordas, Spyridon, Papadatos, Filippos, Consiglio, Steven, Eisenbraun, Eric T., Kaloyeros, Alain E., Gusev, Evgeni P.

Journal:

Journal of Materials Research

Year:

2005

Language:

english

File:

PDF, 194 KB

english, 2005

79

Copper Electroplating on Zero-Thickness ALD Platinum for Nanoscale Computer Chip Interconnects

Kaloyeros, Alain, Zhu, Yu, Dunn, Kathleen, Mayti, Richard, Miller, Christopher, Breslin, Matthew

Journal:

MRS Proceedings

Year:

2006

Language:

english

File:

PDF, 3.92 MB

english, 2006

80

Long-Chain Organofunctional Silanes: Synthesis and Surface Derivatization

Pan, You Lin, Arkles, Barry, Eisenbraun, Eric, Kaloyeros, Alain

Journal:

Advanced Materials Research

Year:

2011

Language:

english

File:

PDF, 339 KB

english, 2011

81

Synthesis and Spectroellipsometric Characterization of Y2O3-stabilized ZrO2-Au Nanocomposite Films for Smart Sensor Applications

Sirinakis, George, Sun, Richard, Siddique, Rezina, Efstathiadis, Harry, Carpenter, Michael A., Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

2004

Language:

english

File:

PDF, 89 KB

english, 2004

82

Low temperature inorganic chemical vapor deposition of Ti–Si–N diffusion barrier liners for gigascale copper interconnect applications

E. Eisenbraun, A. Upham, R. Dash, W. Zeng, J. Hoefnagels, S. Lane, D. Anjum, K. Dovidenko, A. Kaloyeros, B. Arkles, J. J. Sullivan

Year:

2000

Language:

english

File:

PDF, 591 KB

english, 2000

83

[AIP Superconductivity and its applications - Buffalo, New York (USA) (24−26 Sep 1991)] AIP Conference Proceedings - Vapor phase processing of HTS films for technological application

Chen, Ling, Piazza, Timothy W., Kelsey, Jean E., Li, Hongwen, Kaloyeros, Alain E.

Year:

1992

File:

PDF, 764 KB

1992

84

Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications

Papadatos, Filippos, Consiglio, Steve, Skordas, Spyridon, Eisenbraun, Eric T., Kaloyeros, Alain E., Peck, John, Thompson, David, Hoover, Cynthia

Journal:

Journal of Materials Research

Year:

2004

Language:

english

File:

PDF, 1.16 MB

english, 2004

85

Thin-film Deposition of Silicon Nitrides and Oxides from Trihydridosilanes

Arkles, B., Pan, Y., Kaloyeros, A.

Journal:

ECS Transactions

Year:

2014

Language:

english

File:

PDF, 344 KB

english, 2014

86

Integration of chemical vapor deposition Al interconnects in a benzocyclobutene low dielectric constant polymer matrix: A feasibility study

H. Wickland, R. Talevi, Z. Bian, G. Nuesca, S. Sankaran, K. Kumar, R. E. Geer, A. E. Kaloyeros, J. Liu, J. Hummel, E. O. Shaffer, S. J. Martin

Year:

2000

Language:

english

File:

PDF, 1.20 MB

english, 2000

87

ChemInform Abstract: Electrochemical Characteristics of Amorphous Titanium Carbide Films Produced by Low-Temperature Metal-Organic Chemical Vapor Deposition (MOCVD).

ALLOCA, C. M., WILLIAMS, W. S., KALOYEROS, A. E.

Journal:

Year:

1988

File:

PDF, 142 KB

1988

88

Organometallic route to the chemical vapor deposition of titanium carbide films at exceptionally low temperatures

Girolami, Gregory S., Jensen, James A., Pollina, Deborah M., Allocca, Clare M., Kaloyeros, Alain E., Williams, Wendell S.

Journal:

Journal of the American Chemical Society

Year:

1987

Language:

english

File:

PDF, 289 KB

english, 1987

89

[ECS 208th ECS Meeting - Los Angeles, California (October 16-October 21, 2005)] ECS Transactions - ALD: Emerging Materials, Processes, and Nanoscale Technology Applications

Eisenbraun, Eric, Carpenter, Michael, Siddique, Rezina, Naczas, Sebastian, Zeng, Wanxue, Luo, Fu, Kaloyeros, Alain

Year:

2006

Language:

english

File:

PDF, 1.52 MB

english, 2006

90

Microstructure and Optical Properties of Au–Y2O3-stabilized ZrO2 Nanocomposite Films

Sirinakis, George, Siddique, Rezina, Monokroussos, Christos, Carpenter, Michael A., Kaloyeros, Alain E.

Journal:

Journal of Materials Research

Year:

2005

Language:

english

File:

PDF, 248 KB

english, 2005

91

ZERO THICKNESS DIFFUSION BARRIERS AND METALLIZATION LINERS FOR NANOSCALE DEVICE APPLICATIONS

Kaloyeros, Alain E., Eisenbraun, Eric T., Dunn, Kathleen, van der Straten, Oscar

Journal:

Chemical Engineering Communications

Year:

2011

Language:

english

File:

PDF, 488 KB

english, 2011

92

Erratum: “Low temperature metalorganic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization” [J. Vac. Sci. Technol. B 17, 1101 (1999)]

J. E. Kelsey, C. Goldberg, G. Nuesca, G. Peterson, A. E. Kaloyeros, B. Arkles

Year:

1999

Language:

english

File:

PDF, 461 KB

english, 1999

93

Adhesion Energy Measurements of Multilayer Low-K Dielectric Materials for ULSI Applications

Shaffer, E. O., Mills, M. E., Hawn, D., Van Gestel, M., Knorr, A., Gundlach, H., Kumar, K., Kaloyeros, A. E., Geer, R. E.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 338 KB

english, 1998

94

The 2,2,6,6-Tetramethyl-2-Sila-3,5-Heptanedione Route to the Chemical Vapor Deposition of Copper for Gigascale Interconnect Applications

Claessen, Rolf U., Welch, John T., Toscano, Paul J., Banger, Kulbinder K., Kornilov, Andrei M., Eisenbraun, Eric T., Kaloyeros, Alain E.

Journal:

MRS Proceedings

Year:

2000

Language:

english

File:

PDF, 974 KB

english, 2000

95

Time-resolved analysis of the white photoluminescence from chemically synthesized SiC x O y thin films and nanowires

Tabassum, Natasha, Nikas, Vasileios, Ford, Brian, Huang, Mengbing, Kaloyeros, Alain E., Gallis, Spyros

Journal:

Applied Physics Letters

Year:

2016

Language:

english

File:

PDF, 1.21 MB

english, 2016

96

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - Seattle, WA (Sunday 7 July 2002)] Solid State Lighting II - Influence of defects on electrical and optical characteristics of GaN/InGaN-based light-emitting diodes

Cao, Xian-an, Topol, K., Shahedipour-Sandvik, F., Teetsov, J., Sandvik, Peter M., LeBoeuf, Stephen E., Ebong, Abasifreke, Kretchmer, James W., Stokes, Edward B., Arthur, S., Kaloyeros, Alain E., Walke

Year:

2002

Language:

english

File:

PDF, 394 KB

english, 2002

97

[IEEE Proceedings of the IEEE 2001 International Interconnect Technology Conference - Burlingame, CA, USA (2001.06.6-2001.06.6)] Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461) - Atomic layer deposition (ALD) of tantalum-based materials for zero thickness copper barrier applications

Eisenbraun, E., van der Straten, O., Yu Zhu,, Dovidenko, K., Kaloyeros, A.

Year:

2001

Language:

english

File:

PDF, 243 KB

english, 2001

98

Properties of ultrathin platinum deposited by atomic layer deposition for nanoscale copper-metallization schemes

Zhu, Yu, Dunn, Kathleen A., Kaloyeros, Alain E.

Journal:

Journal of Materials Research

Year:

2007

Language:

english

File:

PDF, 244 KB

english, 2007

99

Atomic Layer Deposition of Tantalum Nitride on Organosilicate and Organic Polymerbased Low Dielectric Constant Materials

Straten, Oscar van der, Zhu, Yu, Rullan, Jonathan, Topol, Katarzyna, Dunn, Kathleen, Kaloyeros, Alain

Journal:

MRS Proceedings

Year:

2004

Language:

english

File:

PDF, 289 KB

english, 2004

100

SPIE Proceedings [SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 10 August 2008)] Nanoengineering: Fabrication, Properties, Optics, and Devices V - A comparative study of a-SiC x O y H z thin films grown via chemical vapor deposition for silicon photonics

Gallis, Spyros, Dobisz, Elizabeth A., Eldada, Louay A., Nikas, Vasileios, Suhag, Himani, Huang, Mengbing, Kaloyeros, Alain E.

Year:

2008

Language:

english

File:

PDF, 330 KB

english, 2008

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