6

Selective reactive ion etching of GaAs/AlAs in BCl[sub 3]/SF[sub 6] for gate recess

Year:
2000
Language:
english
File:
PDF, 427 KB
english, 2000
10

HEMT degradation in hydrogen gas

Year:
1994
Language:
english
File:
PDF, 330 KB
english, 1994
11

Ku-band high efficiency high gain pseudomorphic HEMT

Year:
1991
Language:
english
File:
PDF, 352 KB
english, 1991
12

Mass spectrometric characterization of BCl[sub 3]/SF[sub 6] plasmas

Year:
2000
Language:
english
File:
PDF, 287 KB
english, 2000
14

The Effect of Oxygen on the Etch Rate of NF[sub 3] Discharges

Year:
1986
Language:
english
File:
PDF, 518 KB
english, 1986
18

Characterization of SiCl[sub 4]/N[sub 2] Plasmas

Year:
2005
Language:
english
File:
PDF, 72 KB
english, 2005
23

Undergraduate research and intellectual property rights

Year:
1999
Language:
english
File:
PDF, 29 KB
english, 1999
35

Characterization of BCl[sub 3]/N[sub 2] plasmas

Year:
2003
Language:
english
File:
PDF, 531 KB
english, 2003